CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, PATTERN FORMING METHOD, LITHOGRAPHY METHOD, PATTERN, MASK FOR LITHOGRAPHY, AND POLYMERIZABLE COMPOSITION FOR IMPRINTING
申请人:FUJIFILM Corporation
公开号:US20200157267A1
公开(公告)日:2020-05-21
The curable composition for imprinting includes: a compound represented by the following Formula (1); a radically polymerizable compound other than the compound represented by Formula (1); and a photoradical polymerization initiator, in Formula (1), R
1
and R
2
each independently represent a hydrogen atom or an organic group having 1 to 8 carbon atoms and may be bonded to each other to form a ring, R
3
represents a monovalent organic group, and R
4
and R
5
each independently represent a hydrogen atom or a monovalent organic group.