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9-(3-methylphenyl)thioxanthenol | 476331-75-6

中文名称
——
中文别名
——
英文名称
9-(3-methylphenyl)thioxanthenol
英文别名
9-(3-methylphenyl)-9H-thioxanthen-9-ol;9-(3-Methylphenyl)thioxanthen-9-ol
9-(3-methylphenyl)thioxanthenol化学式
CAS
476331-75-6
化学式
C20H16OS
mdl
——
分子量
304.412
InChiKey
FGMPUQBJYAPYHB-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.7
  • 重原子数:
    22
  • 可旋转键数:
    1
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.1
  • 拓扑面积:
    45.5
  • 氢给体数:
    1
  • 氢受体数:
    2

上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    9-(3-methylphenyl)thioxanthenol4-二甲氨基吡啶三甲基氯硅烷 、 nitrated silica gel 作用下, 以 吡啶二氯甲烷乙酸酐二甲基亚砜 为溶剂, 反应 16.0h, 生成 5'-O-[9-(3-methyl-4-nitrophenyl)thioxanthyl]thymidine
    参考文献:
    名称:
    S-Pixyl Analogues as Photocleavable Protecting Groups for Nucleosides
    摘要:
    Several analogues of the 9-phenylthioxanthyl (S-pixyl) photocleavable protecting group have been synthesized, containing substituents on the 9-aryl ring and on the thioxanthyl backbone. Each analogue protected the 5'-hydroxy moiety of thymidine in good to excellent yield. The protected substrates were deprotected in 1:1 water: acetonitrile with irradiation at 300 nm, resulting in recovered thymidine in excellent yield, except for the nitro-substituted analogues which gave substantially lower yields. Substrates with 2,7-dibromo or 3-methoxy substitution on the thioxanthyl backbone were also deprotected efficiently with irradiation at 350 nm. Shorter irradiation times were observed in the less nucleophilic solvent mixture of 1:9 trifluoroethanol:acetonitrile, with no formation of secondary photooxidation products. Photodeprotection with high yields was also achieved in the absence of solvent, with no secondary photoproducts.
    DOI:
    10.1021/jo026009w
  • 作为产物:
    描述:
    9-噻吨酮3-溴甲基苯magnesium1,2-二溴乙烷 作用下, 以 四氢呋喃 为溶剂, 反应 3.0h, 以88%的产率得到9-(3-methylphenyl)thioxanthenol
    参考文献:
    名称:
    S-Pixyl Analogues as Photocleavable Protecting Groups for Nucleosides
    摘要:
    Several analogues of the 9-phenylthioxanthyl (S-pixyl) photocleavable protecting group have been synthesized, containing substituents on the 9-aryl ring and on the thioxanthyl backbone. Each analogue protected the 5'-hydroxy moiety of thymidine in good to excellent yield. The protected substrates were deprotected in 1:1 water: acetonitrile with irradiation at 300 nm, resulting in recovered thymidine in excellent yield, except for the nitro-substituted analogues which gave substantially lower yields. Substrates with 2,7-dibromo or 3-methoxy substitution on the thioxanthyl backbone were also deprotected efficiently with irradiation at 350 nm. Shorter irradiation times were observed in the less nucleophilic solvent mixture of 1:9 trifluoroethanol:acetonitrile, with no formation of secondary photooxidation products. Photodeprotection with high yields was also achieved in the absence of solvent, with no secondary photoproducts.
    DOI:
    10.1021/jo026009w
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文献信息

  • Tricylic amino-acid derivatives
    申请人:Allelix Neuroscience Inc.
    公开号:US06162824A1
    公开(公告)日:2000-12-19
    Described herein are compounds which have the general formula: ##STR1## or a prodrug or pharmaceutically acceptable salt, solvate or hydrate thereof wherein: R.sup.1 is selected from the group consisting of H, alkyl and the counter ion for a basic addition salt; X is selected from the group consisting of CR.sup.9 R.sup.10, S, O, SO, SO.sub.2, NH and N-alkyl; R.sup.2, R.sup.3, R.sup.4, R.sup.9 and R.sup.10 are independently selected from the group consisting of H and alkyl; R.sup.5 and R.sup.6 are independently selected from the group consisting of H, alkyl and phenyl, or, alternatively, R.sup.5 and R.sup.6 together may form a methylene group or a 3- to 6-membered a spirocyclic group; wherein, when X is CR.sup.9 R.sup.10, one or both pairs of R.sup.5 and R.sup.9 or R.sup.6 and R.sup.10 may join to form a double or triple bond R.sup.7 is selected from the group consisting of Formula II-V: ##STR2## which are all optionally substituted, at nodes other than R.sup.8, with 1-4 substituents independently selected from the group consisting of alkyl, halo, aryl (which may be substituted as for R.sup.8), trifluoromethyl, trifluoromethoxy, nitro, cyano, amino, mono-alkylamino, di-alkylamino, alkoxycarbonyl, alkylcarbonyl, alkoxythiocarbonyl, alkylthiocarbonyl, alkoxy, alkylS-, phenoxy, --SO.sub.2 NH.sub.2, --SO.sub.2 NHalkyl, --SO.sub.2 N(alkyl).sub.2 and 1,2-methylenedioxy; and wherein any of the benzo-fused rings in structures II to V may be replaced by a 5- or 6-membered heterocyclic ring selected from the group consisting of pyridine, thiophene, furan and pyrrole; wherein R.sup.8 is selected from the group consisting of H, alkyl, benzyl, cycloalkyl, indanyl and an optionally substituted aryl group, wherein the optional substituents are independently selected from 1-4 members of the group consisting of alkyl, halo, aryl, trifluoromethyl, trifluoromethoxy, nitro, cyano, amino, mono-alkylamino, di-alkylamino, alkoxycarbonyl, alkylcarbonyl, alkoxythiocarbonyl, alkylthiocarbonyl, alkoxy, alkylS-, phenoxy, --SO.sub.2 NH.sub.2, --SO.sub.2 NHalkyl, --SO.sub.2 N(alkyl).sub.2 and 1,2-methylenedioxy; --represents a single or double bond; Y is selected from the group consisting of O, S, SO, NH, N-alkyl, CH.sub.2, CH-alkyl, C(alkyl).sub.2, and C.dbd.O; Z is selected from the group consisting of CH.sub.2, O, S, NH and N-alkyl when--is a single bond; Z is selected from the group consisting of CH and N when--is a double bond. Also described is the use of these compounds as pharmaceuticals.
    本文描述了具有以下一般式的化合物:##STR1##或其前药或药用可接受的盐、溶剂或水合物,其中:R.sup.1选自H、烷基和碱性加成盐的对离子组成的群;X选自CR.sup.9 R.sup.10、S、O、SO、SO.sub.2、NH和N-烷基的群;R.sup.2、R.sup.3、R.sup.4、R.sup.9和R.sup.10独立地选自H和烷基的群;R.sup.5和R.sup.6独立地选自H、烷基和苯基,或者,作为另一选择,R.sup.5和R.sup.6可以一起形成亚甲基基团或3-至6-成员的螺环基团;当X为CR.sup.9 R.sup.10时,R.sup.5和R.sup.9或R.sup.6和R.sup.10中的一个或两个对可能连接以形成双键或三键R.sup.7选自以下式II-V的群:##STR2##它们都可以在除R.sup.8之外的节点上选择性地取代,取代基独立地选自烷基、卤素、芳基(可能像R.sup.8那样被取代)、三氟甲基、三氟甲氧基、硝基、氰基、氨基、单烷基氨基、双烷基氨基、烷氧羰基、烷基羰基、烷氧硫代羰基、烷基硫代羰基、烷氧基、烷基硫、苯氧基、--SO.sub.2 NH.sub.2、--SO.sub.2 NH烷基、--SO.sub.2 N(烷基).sub.2和1,2-亚甲二氧基;结构II至V中的苯并环中的任何一个都可以被选择自吡啶、噻吩、呋喃和吡咯的5-或6-成员杂环环取代;其中R.sup.8选自H、烷基、苄基、环烷基、茚基和一个可选择性取代的芳基,其中可选择性取代基独立地选自烷基、卤素、芳基、三氟甲基、三氟甲氧基、硝基、氰基、氨基、单烷基氨基、双烷基氨基、烷氧羰基、烷基羰基、烷氧硫代羰基、烷基硫代羰基、烷氧基、烷基硫、苯氧基、--SO.sub.2 NH.sub.2、--SO.sub.2 NH烷基、--SO.sub.2 N(烷基).sub.2和1,2-亚甲二氧基;--表示单键或双键;Y选自O、S、SO、NH、N-烷基、CH.sub.2、CH-烷基、C(烷基).sub.2和C.dbd.O的群;当--为单键时,Z选自CH.sub.2、O、S、NH和N-烷基的群;当--为双键时,Z选自CH和N的群。还描述了这些化合物作为药物的用途。
  • US6162824A
    申请人:——
    公开号:US6162824A
    公开(公告)日:2000-12-19
  • [EN] TRICYCLIC COMPOUNDS AS GLYCINE TRANSPORT INHIBITORS<br/>[FR] COMPOSES TRICYCLIQUES COMME INHIBITEURS DE TRANSPORT DE GLYCINE
    申请人:ALLELIX NEUROSCIENCE, INC.
    公开号:WO1999041227A1
    公开(公告)日:1999-08-19
    (EN) The present invention relates to a class of substituted amino acids, pharmaceutical compositions and methods of treating neurological and neuropsychiatric disorders.(FR) L'invention concerne une classe d'acides aminés substitués, des compositions pharmaceutiques et des procédés permettant de traiter des troubles neurologiques et neuropsychiatriques.
  • S-Pixyl Analogues as Photocleavable Protecting Groups for Nucleosides
    作者:Michael P. Coleman、Mary K. Boyd
    DOI:10.1021/jo026009w
    日期:2002.11.1
    Several analogues of the 9-phenylthioxanthyl (S-pixyl) photocleavable protecting group have been synthesized, containing substituents on the 9-aryl ring and on the thioxanthyl backbone. Each analogue protected the 5'-hydroxy moiety of thymidine in good to excellent yield. The protected substrates were deprotected in 1:1 water: acetonitrile with irradiation at 300 nm, resulting in recovered thymidine in excellent yield, except for the nitro-substituted analogues which gave substantially lower yields. Substrates with 2,7-dibromo or 3-methoxy substitution on the thioxanthyl backbone were also deprotected efficiently with irradiation at 350 nm. Shorter irradiation times were observed in the less nucleophilic solvent mixture of 1:9 trifluoroethanol:acetonitrile, with no formation of secondary photooxidation products. Photodeprotection with high yields was also achieved in the absence of solvent, with no secondary photoproducts.
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