Phenyl-p-tolyliodoniumsalz | 46340-49-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Phenyl-p-tolyliodoniumsalz
• 英文别名: Phenyl-p-tolyl-iodonium；Phenyl-p-tolyliodonium；(4-Methylphenyl)-phenyliodanium
• CAS: 46340-49-2
• 化学式: C₁₃H₁₂I
• 分子量: 295.143
• InChiKey: AHUUIUSNLISEGR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.4
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  邻甲基苄醇 、 Phenyl-p-tolyliodoniumsalz 在 sodium carbonate 、 lithium chloride 、 palladium dichloride 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 反应 4.0h， 以85%的产率得到(2-羟基苯基)-(4-甲基苯基)甲酮
  参考文献：
  名称：

  合成中的高价碘 XXXIV：钯催化的邻羟基芳醛与高价碘盐的偶联反应通过醛 CH 键的裂解

  摘要：

  摘要 报道了一种通过钯催化邻羟基芳醛与高价碘鎓盐通过醛 CH 键断裂的偶联反应制备邻羟基芳基酮的新方法，该方法条件温和，产率高。

  DOI：

  10.1080/00397910008087349

文献信息

• Acid generating agent for chemically amplified resist compositions
  申请人：Jung Sung-Do

  公开号：US20090291390A1

  公开（公告）日：2009-11-26

  An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R 6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.

  提供了以下公式（1）或（2）所代表的酸生成剂，该酸生成剂包含在化学增感抗蚀剂组成物中：在公式（1）和（2）中，X代表具有1至20个碳原子的未取代或取代的烷基基团，并且选择自烷基、卤代烷基和烷基磺酰基，该基团可能至少有一个氢原子被醚基团、酯基团、羰基团、缩醛基团、腈基团、氰基团、羟基团、羧基团或醛基团取代，或代表具有1至4个碳原子的全氟烷基基团；R6代表具有1至10个碳原子的烷基基团、具有1至10个碳原子的烷氧基团，或选择自氮、硫、氟和氧的杂原子；m为0至2的整数；A+为有机对离子。
• [EN] DENTAL COMPOSITION COMPRISING A PARTICULATE CARRIER SUPPORTING A COINITIATOR<br/>[FR] COMPOSITION DENTAIRE COMPRENANT UN SUPPORT PARTICULAIRE CONTENANT UN CO-INITIATEUR
  申请人：DENTSPLY DETREY GMBH

  公开号：WO2019043056A1

  公开（公告）日：2019-03-07

  The present invention relates to a dental composition comprising a photoinitiator system comprising a particulate carrier supporting a coinitiator covalently bonded to the surface of the carrier. Furthermore, the present invention relates to a use of the particulate carrier in a dental composition. The particulate carrier displays multiple covalently bonded tertiary amino groups and/or tertiary phosphine groups on the surface, for crosslinking monomers, oligomers and/or polymers having one or more polymerizable double bonds.

  本发明涉及一种牙科组合物，其包括一种光引发剂系统，该系统包括一种颗粒载体，支持着与载体表面共价结合的辅助引发剂。此外，本发明涉及将该颗粒载体用于牙科组合物的用途。该颗粒载体在表面显示多个共价结合的三级胺基团和/或三级膦基团，用于交联具有一个或多个可聚合双键的单体、寡聚物和/或聚合物。
• PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME
  申请人：OH Jung Hoon

  公开号：US20120203024A1

  公开（公告）日：2012-08-09

  A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y 1 , Y 2 , X, R 1 , R 2 , n 1 , n 2 and A + have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

  提供以下公式（1）所代表的光酸发生剂、生产光酸发生剂的方法以及含有光酸发生剂的抗蚀组合物。在公式（1）中，Y1、Y2、X、R1、R2、n1、n2和A+的含义与发明详细说明中定义的含义相同。该光酸发生剂可以在ArF液体浸没光刻时保持适当的接触角，可以减少液体浸没光刻过程中发生的缺陷，并且在抗蚀溶剂中具有优异的溶解性和与树脂的优异兼容性。此外，该光酸发生剂可以通过使用工业上易获得的环氧化合物进行高效简单的生产方法制备。
• ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210179554A1

  公开（公告）日：2021-06-17

  An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.

  提供一种具有化学式（1）的醇铵盐，用作酸扩散抑制剂，以及包括该酸扩散抑制剂的化学增强型抗蚀剂组合物。当通过光刻加工时，该抗蚀剂组合物表现出高灵敏度和优异的光刻性能因素，例如CDU和LWR。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。