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4-乙基-2-辛醇 | 19780-78-0

中文名称
4-乙基-2-辛醇
中文别名
4-乙基-2-辛醇,苏式赤式混合
英文名称
4-Ethyl-2-octanol
英文别名
4-ethyloctan-2-ol
4-乙基-2-辛醇化学式
CAS
19780-78-0
化学式
C10H22O
mdl
——
分子量
158.28
InChiKey
GVKBTEISGUWZEJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    206.4±8.0 °C(Predicted)
  • 密度:
    0.824±0.06 g/cm3(Predicted)
  • 稳定性/保质期:
    避免接触强氧化剂、酸性氯化物以及酸酐。

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    11
  • 可旋转键数:
    6
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    20.2
  • 氢给体数:
    1
  • 氢受体数:
    1

安全信息

  • 危险类别码:
    R36/37/38
  • 安全说明:
    S26

文献信息

  • [EN] PROCESS<br/>[FR] PROCÉDÉ
    申请人:PHOSPHAGENICS LTD
    公开号:WO2018112512A1
    公开(公告)日:2018-06-28
    An efficient and commercial phosphorylation process of a complex alcohol, such as secondary and tertiary alcohols, with P4O10 at high temperatures, and a product obtained by the process.
    一种高效商业化的磷酸酯化过程,用于复杂醇类(如二级和三级醇),在高温下使用P4O10,以及该过程得到的产品。
  • SUBSTITUTED BICYCLIC CYCLIC DERIVATIVE AND USE THEREOF
    申请人:Asahi Kasei Pharma Corporation
    公开号:EP2006271A9
    公开(公告)日:2009-07-29
    [Object] To provide a compound having prostaglandin production-suppressing action and leukotriene production-suppressing action. [Means for solution] A compound represented by the formula (I): [In the formula, ---- represents a single bond, or a double bond, Link represents a single bond, or a saturated or unsaturated straight hydrocarbon having 1 or 2 carbon atoms, W represents a single bond, oxygen atom, sulfur atom, N(Rw) etc., Rw represents hydrogen atom, an alkyl group having 1 to 8 carbon atoms etc, Rs represents -D-Rx etc., D represents a single bond, oxygen atom, sulfur atom etc., Rx represents a linear or branched saturated alkyl group having 3 to 8 carbon atoms etc., one of V1 and V2 represents Zx, and the other represents AR, Zx represents hydrogen atom, a linear or branched saturated alkyl group having 1 to 4 carbon atoms etc., AR represents a partially unsaturated or completely unsaturated condensed bicyclic carbon ring or heterocyclic ring, and Y represents hydrogen atom, a lower alkyl group having 1 to 4 carbon atoms etc.], or a salt thereof.
    [目的]提供一种具有抑制前列腺素生成作用和抑制白三烯生成作用的化合物。 [解决方法] 一种由式(I)表示的化合物: [式中,---- 代表单键或双键,Link 代表单键或具有 1 或 2 个碳原子的饱和或不饱和直链烃,W 代表单键、氧原子、硫原子、N(Rw)等,Rw 代表氢原子、具有 1 至 8 个碳原子的烷基等,Rs 代表-D-Rx 等,D 代表单键、氧原子、硫原子等、Rx 代表具有 3 至 8 个碳原子的直链或支链饱和烷基等,V1 和 V2 中的一个代表 Zx,另一个代表 AR,Zx 代表氢原子、具有 1 至 4 个碳原子的直链或支链饱和烷基等,AR 代表部分不饱和或完全不饱和的缩合双环碳环或杂环,Y 代表氢原子、具有 1 至 4 个碳原子的低级烷基等],或其盐。
  • Polyester-based aqueous coating composition
    申请人:——
    公开号:US20010047057A1
    公开(公告)日:2001-11-29
    Polyester-based aqueous coating compositions comprising a mixture of a carboxyl-functional polyester resin (A), a water-insoluble epoxy resin (B), and a hydrophobic solvent (C), the mixture being neutralized with neutralizer (D) and dispersed or dissolved in water. The compositions have excellent film forming and processing characteristics, and are particularly useful in coating the interior surface of cans and as automobile coatings.
    聚酯基水性涂料组合物,由羧基官能团聚酯树脂(A)、不溶于水的环氧树脂(B)和疏水性溶剂(C)的混合物组成,混合物用中和剂(D)中和并分散或溶解于水中。该组合物具有优异的成膜和加工特性,尤其适用于罐头内表面涂层和汽车涂料。
  • PROCESS
    申请人:Avecho Biotechnology Limited
    公开号:EP3558903A1
    公开(公告)日:2019-10-30
  • RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME
    申请人:YADA Yuji
    公开号:US20110223544A1
    公开(公告)日:2011-09-15
    A resist pattern coating agent includes a hydroxyl group-containing resin and a solvent. The solvent includes an alcohol shown by a following formula (1) in an amount of about 30 mass % or more, R—OH  (1) wherein R represents a branched alkyl group having 3 to 10 carbon atoms. The resist pattern coating agent is used in a resist pattern-forming method. The method includes forming a first resist pattern on a substrate using a first radiation-sensitive resin composition. The first resist pattern is treated with the resist pattern coating agent. A second resist pattern is formed on the substrate treated with the resist pattern coating agent using a second radiation-sensitive resin composition.
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