申请人:Hoechst-Roussel Pharmaceuticals Inc.
公开号:US04914201A1
公开(公告)日:1990-04-03
There are disclosed compounds having the formula ##STR1## where X is H, halogen, --OH, --OCH.sub.3, --NO.sub.2 or --CF.sub.3 ; Y is H, Cl or Br; Z is H, halogen, --OH or --OCH.sub.3 ; and R is H, loweralkyl, --CH.sub.2 OH or diloweralkylaminomethyl, which compounds are useful as analgesic agents.
公开了一些化合物,其化学式为##STR1## 其中X为H,卤素,--OH,--OCH.sub.3,--NO.sub.2或--CF.sub.3; Y为H,Cl或Br; Z为H,卤素,--OH或--OCH.sub.3; R为H,低碳基,--CH.sub.2 OH或二低碳基氨甲基,这些化合物可用作镇痛剂。