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phenylsilyl trifluoromethanesulfonate | 127808-36-0

中文名称
——
中文别名
——
英文名称
phenylsilyl trifluoromethanesulfonate
英文别名
——
phenylsilyl trifluoromethanesulfonate化学式
CAS
127808-36-0
化学式
C7H7F3O3SSi
mdl
——
分子量
256.277
InChiKey
PZABZCASVQXUET-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    222.1±50.0 °C(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    0.26
  • 重原子数:
    15
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.14
  • 拓扑面积:
    51.8
  • 氢给体数:
    0
  • 氢受体数:
    6

反应信息

  • 作为反应物:
    描述:
    参考文献:
    名称:
    Oxidation of Methyl(phenyl)silyleneSynthesis of a Dioxasilirane
    摘要:
    The oxidation of methyl(phenyl)silylene, 3f, with molecular oxygen is investigated using matrix isolation spectroscopy in combination with DFT calculations. The UV irradiation (lambda > 305 nm) of phenylsilyldiazomethane, 8, matrix-isolated in argon at 10 K, produces silylene 3f in very high yield. In O-2 doped argon matrixes, the thermal reaction of 3f with O-2 could be directly monitored by IR spectroscopy. The only reaction product is dioxasilirane 5f, presumably formed via cyclization of silanone O-oxide 4f. DFT calculations reveal that the activation barrier for the 4f --> 5f cyclization is less than 1 kcal/mol, too small to allow the matrix isolation of 4f. Dioxasilirane 5f is photolabile, and irradiation with blue light (lambda > 420 nm) results in a [1,2]-phenyl migration to give silaester 7f. The product of the methyl migration, silaester 13, is formed as a minor constituent.
    DOI:
    10.1021/ja000192y
  • 作为产物:
    描述:
    参考文献:
    名称:
    含有2,4,6-三甲基苯基和2,4,6-三(三氟甲基)苯基取代基的位阻二芳基硅烷的合成与表征。双[2,4,6-三(三氟甲基苯基)]氟硅烷的X射线晶体结构
    摘要:
    受阻二芳基硅烷已经通过两种合成途径制备。Dimesitylsilane,MES 2的SiH 2(1),(MES = 2,4,6-三甲基苯基)通过的三甲苯基溴化镁反应,合成与HSiCl 3,接着用还原的LiAlH 4,或通过均三甲苯基溴化镁与反应(TFO)2 SiH 2。混合的二芳基体系MesPhSiH 2(2)是通过(TfO)PhSiH 2与一当量的MesMgBr反应制得的。通过HSiCl 3的反应制备含有2,4,6-三(三氟甲基)苯基取代基R F的二芳基硅烷与2当量的R F Li一起通过Cl / F卤素交换得到(R F)2 SiHF(3)。用LiAlH 4还原3得到(R F)2 SiH 2(4),其也可以由R F Li和(TfO)2 SiH 2制备。所有化合物均已通过多核NMR,IR,质谱和化学分析进行了表征。的X射线晶体学研究3结果表明,硅的直接几何形状近似为四面体,CSiC角为115
    DOI:
    10.1016/0022-328x(95)00327-m
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文献信息

  • Silicon Tetrakis(trifluoromethanesulfonate): A Simple Neutral Silane Acting as a Soft and Hard Lewis Superacid
    作者:André Hermannsdorfer、Matthias Driess
    DOI:10.1002/anie.202103414
    日期:2021.6.7
    leads to [L2Si(OTf)4] complexes (L=isocyanide, thioether and carbonyl compounds) with retention of all Si−OTf bonds. In contrast, it can cleave C−X bonds (X=F, Cl) of hard organic Lewis bases with a high tendency to form SiX4 (X=F, Cl) after halide/triflate exchange. Most notable, Si(OTf)4 allows a gentle oxydefluorination of mono- and bis(trifluoromethyl)benzenes, resulting in the formation of the corresponding
    据报道,原始四(三氟甲磺酸)Si(OTf) 4的简单合成和分离是第一种适用于软和硬路易斯碱的中性基路易斯超强酸。其 OTf 基团具有双重功能:它们是优异的离去基团,并调节对软路易斯碱和硬路易斯碱的反应程度。暴露于软路易斯供体时,Si(OTf) 4产生[L 2 Si(OTf) 4 ]配合物(L=异化物、醚和羰基化合物),并保留所有Si−OTf键。相反,它可以裂解硬有机路易斯碱的CX键(X = F,Cl),并且在卤化物/三氟甲磺酸酯交换后很容易形成SiX 4 (X = F,Cl)。最值得注意的是,Si(OTf) 4允许单(三甲基)苯和双(三甲基)苯发生温和的氧化脱反应,从而形成相应的苯甲酰鎓物种,并通过弱配位的[Si(OTf) 6 ]二价阴离子进行稳定。
  • Neuartige silyltriflat-derivate
    作者:Wolfram Uhlig、Alfred Tzschach
    DOI:10.1016/0022-328x(89)85014-4
    日期:1989.11
    The selective cleavage of phenylsilanes by triflic acid gives novel silyltriflates. Unique, substituted derivatives have been synthesized by alkylation with organometallic reagents. Triflate derivatives of oligo- and cyclo-silanes are similarly formed.
    三氟甲磺酸选择性裂解苯基硅烷产生了新颖的甲硅烷三氟甲磺酸酯。通过用有机属试剂进行烷基化合成了独特的取代衍生物。低聚和环硅烷三氟甲磺酸酯衍生物类似地形成。
  • Synthesis and characterization of 2,4,6-tris((dimethylamino)methyl)phenoxysilicon compounds
    作者:Aman Akkari-El Ahdab、Ghassoub Rima、Heinz Gornitzka、Jacques Barrau
    DOI:10.1016/s0022-328x(01)01053-1
    日期:2001.11
    hexacoordinated [4+2] in 9. The 1H-NMR features are consistent, in all cases, with dynamic coordination mode of the o-NMe2 groups in solution at room temperature. The solid-state structures of the lithium phenolate and of compounds 6 and 9 have been determined by X-ray diffraction. The trimeric structure of ArOLi contains an Li3O3-ring that is almost perfectly planar; the structures of 6 and 9 confirm no
    一系列2,4,6-三((二甲基基)甲基)苯氧基化合物Σ4− n Si(OAr)n(Σ= Cl; n = 1(1),2(2);Σ= Me,n = 1(3),2(4);Σ= Me 3 Si,n = 1(5),2(6)),PhSiH n(OAr)3− n(n = 2(7),1(8))和H n Si(OAr)4− n(n = 2(9),1(10))已通过各种适应方法合成。通过29 Si-,1 H-,13 C-,15 N-NMR对化合物进行光谱表征。在溶液中的⋯N键的形成和协调这些化合物中的程度是从所确定的29的Si-NMR(和15 N)化学位移和1 Ĵ SiH。中心四配位在3 - 6,在五配位的1,2,7,8和六配位[4 + 2] 9。在1在所有情况下,H-NMR特征在室温下与溶液中o -NMe 2基团的动态配位模式一致。以及化合物6和9的固态结构已经通过X射线衍射测定。ArOLi
  • Uhlig, Wolfram, Chemische Berichte, 1992, vol. 125, # 1, p. 47 - 54
    作者:Uhlig, Wolfram
    DOI:——
    日期:——
  • Reactions of methyl(phenyl)silylene with CO and PH3—the formation of acid–base complexes
    作者:Holger Bornemann、Wolfram Sander
    DOI:10.1016/s0022-328x(01)01363-8
    日期:2002.1
    The thermal reaction of methyl(phenyl)silylene 1a with CO and PH3, respectively, was investigated using matrix isolation spectroscopy in combination with DFT calculations. The silylene la was produced by UV irradiation (gimel > 400 nm followed by gimel > 350 nm) of (phenyl)silyldiazomethane 2 in high yields. The thermal reaction of 2 with CO in CO-doped argon matrices produces the acid-base adduct 3 which was identified by IR and UV spectroscopy. The analogous reaction with PH3 produced the acid-base adduct 4. Complex 4 is photolabile and on irradiation with UV light (gimel > 350 nm) rearranges to methylphenyl(phosphino)silane 5, the product of the insertion of the silicon atom into a PH bond. (C) 2002 Published by Elsevier Science B.V.
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