A polymer comprising recurring units of formula (1-1) or (1-2) wherein R
1
, R
2
, R
3
and R
4
are H or alkyl, or R
1
and R
2
, and R
3
and R
4
taken together may form a ring with each pair being alkylene, and k is 0 or 1 and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
1
具有以下公式(1-1)或(1-2)重复单元的聚合物,其中R1、R2、R3和R4为H或烷基,或者R1和R2,以及R3和R4组成的每对可以成为亚烷基环,k为0或1,其Mw为1,000-500,000是新颖的。以该聚合物作为基础
树脂的抗蚀剂组合物对高能辐射敏感,具有优异的敏感度、分辨率、蚀刻抗性和最小化膨胀,并适用于电子束或深紫外线微细图案化。