申请人:Fuji Photo Film Co., Ltd.
公开号:US05049477A1
公开(公告)日:1991-09-17
A radiation responsive composition containing a compound represented by the following formula (I) and a photoreducing agent capable of forming a redox couple together with said compound for many uses, e.g., image formation, etching, plating, etc.: ##STR1## wherein N represents a nitrogen atom; X represents an oxygen atom (--O--), a sulfur atom (--S--), or a nitrogen-containing group of formula, ##STR2## R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each represents a mere bond, a substituted or unsubstituted alkyl, aryl, heterocyclic, acyl, aralkyl, alkenyl, alkynyl or carbamoyl group, or a sulfonyl group into which a substituted or unsubstituted alkyl or aryl group has been introduced, provided that at least one of the substituents R.sup.1 to R.sup.3 be a substituted or unsubstituted aryl or heterocyclic group and that two or more of R.sup.1, R.sup.2 and R.sup.3, or of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 when X represents a nitrogen containing group of formula, ##STR3## may be taken together to form a ring; UG represents a group to be released from said compound of formula (I) taking advantage of the N--X bond cleavage as a trigger, which takes place when a redox couple is formed between said compound of formula (I) and the photoreducing agent irradiated with radiant rays; and the solid lines represent bonds, while broken lines indicate that a bond may or may not be present, but at least one of the broken lines forms a bond.
一种辐射响应组合物,包含下式(I)所表示的化合物和一种光还原剂,能够与该化合物形成氧化还原偶,用于多种用途,例如图像形成、蚀刻、电镀等等:##STR1## 其中,N代表氮原子;X代表氧原子(-O-)、硫原子(-S-)或者是一个含氮基团,其化学式为:##STR2## R1、R2、R3和R4每个代表一个单键、一个取代或未取代的烷基、芳基、杂环、酰基、芳基烷基、烯基、炔基或者是一个磺酰基,该磺酰基中引入了一个取代或未取代的烷基或芳基,只要至少有一个取代基R1到R3是一个取代或未取代的芳基或杂环基团,而且当X代表一个含氮基团的化学式时,R1、R2、R3和R4中的两个或更多个,或者是R1、R2、R3和R4中的两个或更多个,可以结合形成一个环;UG代表从式(I)的化合物中释放出来的一个基团,该释放是利用N-X键断裂作为触发器进行的,当在辐射射线的照射下,该化合物与光还原剂形成氧化还原偶时发生;实线表示化学键,而虚线表示化学键可以存在也可以不存在,但至少有一条虚线形成了化学键。