An ester compound of formula (1) is provided.
1
R
1
is H or methyl, R
2
is tertiary C
4-20
alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.
提供了
化学式为(1)的
酯类化合物。其中1R1为氢或甲基,R2为三级C4-20烷基,k=0或1。含有该
酯类化合物聚合物的抗蚀剂组合物对高能辐射敏感,具有优异的敏感性、分辨率、蚀刻耐性和基板附着性,并适用于使用电子束或深紫外线进行微观图案制备。