4-甲基戊酸戊酯 | 25415-71-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 中文名称: 4-甲基戊酸戊酯
• 英文名称: Pentyl 4-methylpentanoate
• CAS: 25415-71-8
• 化学式: C₁₁H₂₂O₂
• 分子量: 186.29
• InChiKey: ZOEZQOYTJSALQT-UHFFFAOYSA-N

物化性质

• LogP：
  4.196 (est)
• 保留指数：
  1249;1215;1215;1232;1215

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  13
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• COMPOUND, RESIN AND PHOTORESIST COMPOSITION
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160237190A1

  公开（公告）日：2016-08-18

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom or a methyl group; R 2 represents a C1-C12 hydrocarbon group; X a and X b each independently represent an oxygen atom or a sulfur atom; X 11 represents a C1-C12 divalent saturated hydrocarbon group where a hydrogen atom can be replaced by a fluorine atom; and A 1 represents a C1-C12 divalent saturated hydrocarbon group or *-A 2 -X 1 -(A 3 -X 2 ) a -A 4 -, where * represents a binding site to an oxygen atom, A 2 , A 3 and A 4 each independently represent a C1-C12 divalent hydrocarbon group, X 1 and X 2 each independently represent —O—, —CO—O—, —O—CO— or —O—CO—O—, and “a” represents 0 or 1.

  化合物的化学式（I）表示为：其中R1代表氢原子或甲基基团；R2代表一个C1-C12烃基团；Xa和Xb分别代表氧原子或硫原子；X11代表一个C1-C12二价饱和碳氢基团，其中氢原子可以被氟原子取代；A1代表一个C1-C12二价饱和碳氢基团或*-A2-X1-(A3-X2)a-A4-，其中*代表与氧原子结合的位点，A2、A3和A4分别代表一个C1-C12二价碳氢基团，X1和X2分别代表—O—、—CO—O—、—O—CO—或—O—CO—O—，而“a”代表0或1。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20170247323A1

  公开（公告）日：2017-08-31

  A salt having a group represented by the formula (aa): wherein X a and X b independently each represent an oxygen atom or a sulfur atom, the ring W represents a C3-C36 heterocyclic ring which has an ester bond or a thioester bond, said heterocyclic ring optionally further having an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group each by which a methylene group has been replaced, and said heterocycilic ring optionally having a hydroxyl group, a cyano group, a carboxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C2-C13 alkoxycarbonyl group, a C2-C13 acyl group, a C2-C13 acyloxy group, a C3-C12 alicyclic hydrocarbon group, a C6-C10 aromatic hydrocarbon group or any combination of these groups each by which a hydrogen atom has been replaced, and * represents a binding position.

  一种盐，其具有由公式（aa）表示的基团：其中Xa和Xb独立地代表一个氧原子或一个硫原子，环W代表一个具有酯键或硫酯键的C3-C36杂环环，该杂环环还可以进一步具有一个氧原子、一个硫原子、一个羰基或一个磺酰基，其中每个都已被一个亚甲基取代，该杂环环还可以具有一个羟基、一个氰基、一个羧基、一个C1-C12烷基、一个C1-C12烷氧基、一个C2-C13烷氧羰基、一个C2-C13酰基、一个C2-C13酰氧基、一个C3-C12脂环烃基、一个C6-C10芳香烃基或任何组合，其中每个都已被氢原子取代，*表示一个结合位置。
• PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20150241769A1

  公开（公告）日：2015-08-27

  A photoresist composition comprising a resin having an acid-labile group, an acid generator, and a compound represented by formula (I0).
• RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160077433A1

  公开（公告）日：2016-03-17

  A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R 3 represents a hydrogen atom or a methyl group, and R 4 represents a C 1 to C 24 saturated hydrocarbon group having a fluorine atom where a methylene group may be replaced by an oxygen atom or a carbonyl group; R 7 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group that may have a halogen atom; ring X 1 represents a C 2 to C 36 heterocyclic group containing a nitrogen atom and a carbonyl group, a hydrogen atom contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C 1 to C 24 hydrocarbon, a C 1 to C 12 alkoxyl group, a C 2 to C 4 acyl group, or a C 2 to C 4 acyloxy group, and a methylene group contained in the heterocyclic group may be replaced by an oxygen atom or a carbonyl group.
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160139508A1

  公开（公告）日：2016-05-19

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R 2 represents a C 5 to C 18 hydrocarbon group consisting of the following groups (a) and (b): (a) a liner or branched divalent hydrocarbon group and (b) an alicyclic hydrocarbon group, Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group, A 1 represents a single bond, a C1 to C6 alkanediyl group or *-A 2 -X 1 -(A 3 -X 2 ) a -(A 4 ) b -, * represents a binding site to an oxygen atom, A 2 , A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group, X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—, a represents 0 or 1, and b represents 0 or 1.

表征谱图