N1-di(cyclohexylamino)methylenebenzamide | 6074-63-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N1-di(cyclohexylamino)methylenebenzamide
• 英文别名: N-(N,N'-dicyclohexylcarbamimidoyl)benzamide
• CAS: 6074-63-1
• 化学式: C₂₀H₂₉N₃O
• 分子量: 327.47
• InChiKey: RZPSHHIAZGMUGJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  24
• 可旋转键数：
  5
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  53.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  benzoyl-dithiocarbonimidic acid diethyl ester 在 氯 作用下， 以 四氯化碳 、 苯 为溶剂， 生成 N1-di(cyclohexylamino)methylenebenzamide
  参考文献：
  名称：

  Neidlein,R.; Haussmann,W., Chemische Berichte, 1966, vol. 99, p. 239 - 243

  摘要：

  DOI：

文献信息

• Synthesis of Multisubstituted Guanidines through Palladium-Catalyzed Insertion of Isonitriles
  作者：Li Yang、Hai-Tao Tang、Pei-Xia Li、Xiu-Jin Meng、Ying-Ming Pan

  DOI：10.1055/s-0037-1610981

  日期：2018.10

  A new method for the synthesis of multisubstituted guanidines through tandem intermolecular insertion of isonitriles with un­activated amides has been developed. In this study, isonitriles could be used not only as reaction materials but also as the source of amines.

  开发了一种通过串联分子间插入异腈与未活化酰胺合成多取代胍的新方法。在这项研究中，异腈不仅可以用作反应材料，还可以用作胺的来源。
• Study of N -benzoyl-activation in the HgCl 2 -promoted guanylation reaction of thioureas. Synthesis and structural analysis of N -benzoyl-guanidines
  作者：Silvio Cunha、Maı́sa B Costa、Hamilton B Napolitano、Carlito Lariucci、Ivo Vencato

  DOI：10.1016/s0040-4020(00)01168-6

  日期：2001.2

  demonstrated that the benzoyl group is an activating group for thioureas in the HgCl2-guanylation reaction. Thus N-benzoyl-thioureas containing electronically neutral and even electron-withdrawing or electron-releasing substituents are converted into guanidines with reasonable yields. In addition, NMR and X-ray structural analyses were performed to understand the intra- and intermolecular features of the synthesized

  在这项工作中，证明了苯甲酰基是HgCl 2-鸟苷酸化反应中硫脲的活化基团。因此，含有电子中性且甚至吸电子或释放电子的取代基的N-苯甲酰基-硫脲以合理的产率转化为胍。此外，进行了NMR和X射线结构分析以了解合成胍的分子内和分子间特征。
• Bismuth nitrate pentahydrate: a new and environmentally benign reagent for guanidylation of N-benzoylthioureas
  作者：Silvio Cunha、Byanka R de Lima、Aparecido R de Souza

  DOI：10.1016/s0040-4039(01)02067-6

  日期：2002.1

  The bismuth nitrate-mediated guanidylation of N-benzoylthioureas was studied. This salt proved to be an effective guanylating reagent and allowed the obtention of N-benzoyl-guanidines in good yields. The methodology described is a promising alternative to the use of toxic HgCl2 in the synthesis of polysubstituted guanidines.

  研究了硝酸铋介导的N-苯甲酰硫脲的胍基化。该盐被证明是有效的胍基化试剂，并且可以良好的产率获得N-苯甲酰基-胍。所描述的方法是在合成多取代的胍类中使用有毒的HgCl 2的有前途的替代方法。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND RESIN
  申请人：FUJIFILM Corporation

  公开号：US20150132688A1

  公开（公告）日：2015-05-14

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种光致射线敏感或辐射敏感的树脂组合物，其中包括（P）具有（a）由特定公式表示的重复单元的树脂；使用该光致射线敏感或辐射敏感的树脂组合物形成的抗蚀膜；包括（i）使用该光致射线敏感或辐射敏感的树脂组合物形成膜的步骤，（ii）曝光膜的步骤，以及（iii）使用显影剂显影曝光的膜以形成图案的图案形成方法；一种制造电子设备的方法，包括图案形成方法；以及通过电子设备的制造方法制造的电子设备。
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160018734A1

  公开（公告）日：2016-01-21

  There is provided a pattern forming method comprising (a) a step of forming a film on a substrate using an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, (b) a step of forming a top coat layer on the film using a top coat composition containing a resin (T) containing at least any one of repeating units represented by formulae (I-1) to (I-5) shown below, (c) a step of exposing the film having the top coat layer using an electron beam or an extreme ultraviolet radiation, and (d) a step of developing the film having the top coat layer after the exposure to form a pattern.

  提供了一种图案形成方法，包括以下步骤：(a)使用电子束敏感或极紫外辐射敏感的树脂组合物在基板上形成薄膜的步骤，(b)使用含有至少一个由下式(I-1)到(I-5)中所示的重复单元表示的树脂(T)的顶层涂料组成的顶层涂料层的形成步骤，(c)使用电子束或极紫外辐射照射具有顶层涂料层的薄膜的步骤，以及(d)在照射后开发具有顶层涂料层的薄膜以形成图案的步骤。