3-Ethylpentan-3-yl prop-2-enoate | 1448551-44-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3-Ethylpentan-3-yl prop-2-enoate
• CAS: 1448551-44-7
• 化学式: C₁₀H₁₈O₂
• 分子量: 170.252
• InChiKey: PJUPFIJUOPNOAW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  3-Ethylpentan-3-yl prop-2-enoate 以 乙醚 为溶剂， 反应 20.0h， 生成 (2R,3R,4S,5S)-3-ethylpentan-3-yl 5-((tert-butyldimethylsilyl)oxy)-7-((3,4-dimethoxybenzyl)oxy)-3-hydroxy-2,4-dimethylheptanoate
  参考文献：
  名称：

  (Diisopinocampheyl)borane-Mediated Reductive Aldol Reactions of Acrylate Esters: Enantioselective Synthesis of Anti-Aldols

  摘要：

  The (diisopinocampheyl)borane promoted reductive aldol reaction of acrylate esters 4 is described. Isomerization of the kinetically formed Z(O)-enolborinate 5Z to the thermodynamic E(O)-enolborinate 5E via 1,3-boratropic shifts, followed by treatment with representative achiral aldehydes, leads to anti-alpha-methyl-beta-hydroxy esters 9 or 10 with excellent diastereo- (up to >= 20:1 dr) and enantioselectivity (up to 87% ee). The results of double asymmetric reactions of 5E with several chiral aldehydes are also presented.

  DOI：

  10.1021/ol401679g
• 作为产物：
  描述：

  3-乙基-3-戊醇 、 丙烯酰氯 在 正丁基锂 作用下， 以 四氢呋喃 、 正己烷 为溶剂， 反应 0.33h， 以70%的产率得到3-Ethylpentan-3-yl prop-2-enoate
  参考文献：
  名称：

  (Diisopinocampheyl)borane-Mediated Reductive Aldol Reactions of Acrylate Esters: Enantioselective Synthesis of Anti-Aldols

  摘要：

  The (diisopinocampheyl)borane promoted reductive aldol reaction of acrylate esters 4 is described. Isomerization of the kinetically formed Z(O)-enolborinate 5Z to the thermodynamic E(O)-enolborinate 5E via 1,3-boratropic shifts, followed by treatment with representative achiral aldehydes, leads to anti-alpha-methyl-beta-hydroxy esters 9 or 10 with excellent diastereo- (up to >= 20:1 dr) and enantioselectivity (up to 87% ee). The results of double asymmetric reactions of 5E with several chiral aldehydes are also presented.

  DOI：

  10.1021/ol401679g

文献信息

• PROCESS FOR PREPARING TERTIARY ALKYL ESTERS OF (METH) ACRYLIC ACID HAVING AT LEAST 4 CARBON ATOMS IN THE ALKYL RADICAL
  申请人：Lipowsky Gunter

  公开号：US20090023947A1

  公开（公告）日：2009-01-22

  A process for preparing tertiary alkyl esters of (meth)acrylic acid having at least 4 carbon atoms in the alkyl radical, comprising the steps of: (1) reacting (meth)acrylic acid with at least one olefin of the general formula I: in which R 1 and R 2 are an alkyl radical, and R 3 is a hydrogen atom, an alkyl radical, a cycloalkyl radical, an aryl radical, an alkylcycloalkyl radical, an alkylaryl radical, a cycloalkylaryl radical, or an alkylcycloalkylaryl radical; in homogeneous phase in the presence of an acidic catalyst in a reactor, (2) discharging the resulting reaction mixture (1) from the reactor, (3) separating the discharged reaction mixture (2) into a mixture (3.1) which comprises the catalyst and a mixture (3.2) which comprises the tertiary alkyl ester of (meth)acrylic acid having at least 4 carbon atoms in the alkyl radical, and (4) removing the tertiary alkyl ester of (meth)acrylic acid having at least 4 carbon atoms in the alkyl radical from the mixture (3.2), wherein, (5) in process step (4), at least one compound S which comprises at least one N-oxyl group is added as a stabilizer.

  一种制备具有至少4个碳原子的烷基基团的(甲基)丙烯酸的三级烷基酯的方法，包括以下步骤：(1) 在反应器中，在酸性催化剂的存在下，将(甲基)丙烯酸与至少一种具有通式I的烯烃反应：其中R1和R2为烷基基团，R3为氢原子、烷基基团、环烷基基团、芳基、烷基环烷基基团、烷基芳基基团、环烷基芳基基团或烷基环烷基芳基基团；(2) 从反应器中排出得到的反应混合物(1)；(3) 将排出的反应混合物(2)分离为包含催化剂的混合物(3.1)和包含至少4个碳原子的烷基基团的(甲基)丙烯酸的三级烷基酯的混合物(3.2)；(4) 从混合物(3.2)中去除至少4个碳原子的烷基基团的(甲基)丙烯酸的三级烷基酯；其中，在步骤(4)中，至少添加一种包含至少一个N-氧基团的化合物S作为稳定剂。
• Maleimide group-containing polymer particles and method of producing the same
  申请人：Inaba Yoshihiro

  公开号：US20050014924A1

  公开（公告）日：2005-01-20

  The present invention relates to a maleimide group-containing polymer particle containing a crosslinked polymer particle containing a group represented by the following formula (1) and to a method of producing the maleimide group-containing crosslinked polymer particle by reacting hydroxymethylmaleimide with a hydroxyl group-containing polymer particle obtained by introducing a polyethylene glycol into a crosslinked polymer particle: wherein n denotes an integer of 1 or more.

  本发明涉及一种含有马来酰亚胺基团的交联聚合物颗粒，其中包含一个由以下公式（1）表示的基团的交联聚合物颗粒，并且涉及通过将羟甲基马来酰亚胺与引入聚乙二醇的交联聚合物颗粒中含有羟基的聚合物颗粒反应来制造含有马来酰亚胺基团的交联聚合物颗粒的方法：其中n表示1或更多个整数。
• Coating Composition, Optical Film, Antireflective, Film, Polarizing Plate, And Display Device Using The Same
  申请人：Yoshizawa Masataka

  公开号：US20080038561A1

  公开（公告）日：2008-02-14

  There is provided a coating composition capable of improving evenness in drying and evenness in airing and causing no impairment of evenness in coating, which is useful for an antireflective film having high uniformity in surface conditions and attaining sufficient antireflection performance and for a polarizing plate and a display device each using such an antireflective film. As the coating composition as mentioned above, a coating composition including a fluoroaliphatic group-containing copolymer that includes a repeating unit corresponding to the fluoroaliphatic group-containing monomer represented by the following formula (1) and a repeating unit corresponding to the monomer represented by the following formula (2) was found: in formula [1], R 0 represents a hydrogen atom, a halogen atom or a methyl group; L represents a divalent linkage group; and n represents an integer of 1 to 18, and in formula [2], R 11 represents a hydrogen atom, a halogen atom or a methyl group; L 11 represents a divalent linkage group; and R 13 , R 14 and R 15 each represents a 1-20C linear, branched or cyclic alkyl group which may have a substituent.

  提供了一种涂层组合物，能够提高干燥均匀性和通风均匀性，且不会影响涂层均匀性，该组合物对于具有高表面条件均匀性和达到足够抗反射性能的抗反射膜以及使用此类抗反射膜的偏光板和显示装置非常有用。作为上述涂层组合物，发现包括重复单元对应于以下公式（1）所表示的含氟脂肪基单体的含氟脂肪基共聚物和对应于以下公式（2）所表示的单体的重复单元的涂层组合物：在公式[1]中，R0表示氢原子、卤素原子或甲基基团；L表示双价连接基团；n表示1到18的整数，在公式[2]中，R11表示氢原子、卤素原子或甲基基团；L11表示双价连接基团；R13、R14和R15分别表示1-20C线性、支链或环状烷基，可以有取代基。
• HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME
  申请人：Infineum International Limited

  公开号：EP3839017A1

  公开（公告）日：2021-06-23

  A comb copolymer viscosity modifier may be made by polymerization comprising at least, or consisting essentially of, the following monomers: (a) a hydrogenated polybutadiene-based (alk)acrylate ester macromonomer (which repeat units may comprise from 7.0 wt% to 18 wt% of the repeat units of the comb copolymer viscosity modifier); (b) a C3-C8 alkyl (alk)acrylate ester monomer (which repeat units may comprise from 40 wt% to 71 wt% or from 45 wt% to 64 wt% of the repeat units of the comb copolymer viscosity modifier); and (c) a C12-C24 alkyl (alk)acrylate ester monomer, wherein repeat units based on the C12-C24 alkyl (alk)acrylate ester monomer comprise at least 21.0 wt% (and optionally up to 35.0 wt%) of repeat units of the comb copolymer viscosity modifier. Lubricant compositions comprising the comb copolymer viscosity modifier, as well as uses thereof and methods for modifying viscosity, are also contemplated herein.

  梳状共聚物粘指剂可通过聚合制成，至少或主要由以下单体组成：(a) 氢化聚丁二烯基（烷基）丙烯酸酯大单体（其重复单元可占梳状共聚物粘指剂重复单元的 7.0 wt% 至 18 wt%）；(b) C3-C8 烷基（烷基）丙烯酸酯单体（其重复单元可占梳状共聚物粘指剂重复单元的 7.(b) C3-C8 烷基(烷基)丙烯酸酯单体(其重复单元可占梳状共聚物粘指剂重复单元的 40% 至 71% 或 45% 至 64%)；(c) C12-C24 烷基(烷基)丙烯酸酯单体，其中基于 C12-C24 烷基(烷基)丙烯酸酯单体的重复单元占至少 21.0 wt%（可选最多 35.0 wt%）的组合共聚物粘指剂重复单元。本文还考虑了包含梳状共聚物粘指剂的润滑剂组合物及其用途和粘度调节方法。
• Topcoat compositions and pattern-forming methods
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US10042259B2

  公开（公告）日：2018-08-07

  Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.

  面漆组合物包括：基质聚合物；表面活性聚合物，该聚合物由以下通式 (I) 的单体聚合而成： 其中R1 代表 H、F、甲基或氟化甲基； R2 代表任选取代的 C1 至 C8 亚烷基或任选取代的 C1 至 C8 氟亚烷基，任选包含一个或多个杂原子； R3 代表 H、F、任选取代的 C1 至 C10 烷基或任选取代的 C5 至 C15 芳基，任选包含一个或多个杂原子；R4 代表任选取代的 C1 至 C8 烷基、任选取代的 C1 至 C8 氟烷基或任选取代的 C5 至 C15 芳基，任选包含一个或多个杂原子；X 代表 O、S 或 NR5，其中 R5 选自氢和任选取代的 C1 至 C5 烷基；a 为 0 或 1；以及溶剂。本发明还提供了涂层基底和图案形成方法，这些基底和方法都使用了本发明的面漆组合物。本发明特别适用于光刻工艺，作为制造半导体器件的光刻胶面涂层。