4-苯甲酰基-1,3-苯二酚双(6-偶氮-5,6-二氢-5-氧代萘-1-磺酸)酯 | 31001-73-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 4-苯甲酰基-1,3-苯二酚双(6-偶氮-5,6-二氢-5-氧代萘-1-磺酸)酯
• 英文名称: 2,4-di(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone
• 英文别名: 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy)benzophenone；2,4-bis(1,2-dihydro-2-diazo-1-oxonaphthalene-5-sulfonyloxy)benzophenone；diazoester；[4-benzoyl-3-[(6E)-6-diazo-5-oxonaphthalen-1-yl]sulfonyloxyphenyl] (6E)-6-diazo-5-oxonaphthalene-1-sulfonate
• CAS: 31001-73-7
• 化学式: C₃₃H₁₈N₄O₉S₂
• 分子量: 678.659
• InChiKey: RVUFIAZZLHJNJS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.9
• 重原子数：
  48
• 可旋转键数：
  8
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  223
• 氢给体数：
  0
• 氢受体数：
  11

反应信息

• 作为反应物：
  描述：

  4-苯甲酰基-1,3-苯二酚双(6-偶氮-5,6-二氢-5-氧代萘-1-磺酸)酯 以 乙腈 为溶剂， 生成
  参考文献：
  名称：

  溶剂、激发波长和浓度对某些重氮萘醌光行为的影响

  摘要：

  重氮萘醌 (DNQ) 是用于制造集成电路的抗蚀剂的光敏成分。暴露于辐射这些化合物释放分子氮经历环收缩（沃尔夫重排）。在这项工作中，研究了带有两个和三个发色团 DNQ 单元的三种化合物的光行为。使用一些照射波长和不同的 DNQ 浓度，在 290 K 的乙腈和 80 K 的乙醇/甲醇（4/1，v/v）固体基质中测定了反应物消失的光化学量子效率。所得结果表明，光反应过程很大程度上取决于介质、浓度、温度和激发波长。

  DOI：

  10.3998/ark.5550190.0012.915
• 作为产物：
  描述：

  2,4-二羟二苯甲酮 、 2-重氮-1-萘酚-5-磺酰氯 在 苄基三乙基氯化铵 、 sodium carbonate 作用下， 以 二氯甲烷 、 水 为溶剂， 生成 4-苯甲酰基-1,3-苯二酚双(6-偶氮-5,6-二氢-5-氧代萘-1-磺酸)酯
  参考文献：
  名称：

  Chromophore specific photoreactivity in 2,3,4-Tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone

  摘要：

  Different electronic structures for the three 1,2-naphthoquinone-2-diazide (NQD) chromophores in 2,3,4-tri (1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone were detected using H-1 NMR spectroscopy. The NQD substituent in the o-position of the benzophenone is influenced by intramolecular through space interactions with the benzophenone part of the molecule. The change in the electronic structure is the reason for the obtained different photoreactivity of the o-NQD chromophore compared with m-NQD and p-NQD. The relative quantum yields of photolysis are 0.3 (o-NQD) and 0.9/1.0 (m-NQD/p-NQD).

  DOI：

  10.1002/prac.19943360805

文献信息

• Low striation positive diazoketone resist composition with cyclic
  申请人：Allied Corporation

  公开号：US04526856A1

  公开（公告）日：1985-07-02

  A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.

  提供了一种新型光刻胶配方，具有低条纹和优异的润湿性能。该光刻胶组合物可通过旋涂在集成电路制造中使用的各种基底上应用。该发明的基本组成部分是溶剂组合物，其中包括环戊酮（或环戊酮-环己酮混合物）和一个碳数为5-12的脂肪醇。当这些溶剂成分以某些特定比例使用时，可以意外地提供各种基底的良好润湿性和低条纹薄膜。
• Photochemical image process of positive photoresist element with
  申请人：Hoechst Celanese Corporation

  公开号：US05059513A1

  公开（公告）日：1991-10-22

  Actinic (deep ultraviolet, ultraviolet and visible) light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of CO--NH--CO groups, such as maleimide and especially maleimide--substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or .alpha.-methylstyrene in a 1:1 molar ratio. The preferred methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-B in Table I. The present invention also comtemplates photosensitive elements and thermally stable phtochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photo-chemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230.degree. C. and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.

  本发明公开了一种敏感于Actinic（深紫外线、紫外线和可见光）光的正向光刻胶组合物，其包含一种能够在暴露于Actinic辐射下转化为碱溶性物种的碱不溶性光活性化合物的混合物，其量足以使混合物相对碱不溶性，并且包含一种聚合物，该聚合物包含足量的CO--NH--CO基团，例如马来酰亚胺和特别是马来酰亚胺取代的苯乙烯共聚物，其量足以使混合物在暴露于Actinic辐射下很容易溶于碱。首选的共聚物包括马来酰亚胺/苯乙烯或α-甲基苯乙烯在1:1的摩尔比。首选的甲基苯乙烯在1:1的摩尔比。适用于响应深紫外线Actinic辐射的正向光刻胶组合物的首选光活性化合物具有表I中的18-B式。本发明还包括基于Actinic光敏正向光刻胶组合物的光敏元件和热稳定的光化学成像系统。将正向光刻胶组合物涂覆在基底上以产生光敏元件，该元件在暴露于波长在约200-700nm的Actinic辐射的图案下产生可进行碱性显影的光化学成像系统，通过高度选择性地去除暴露区域来形成高度分辨率的图案。显影后，本发明的光化学成像系统的首选实施例在230°C的后烘烤下高分辨率特征（一微米）的图案图像变化微不足道，并且随后很容易去除。本发明的正向光刻胶组合物形成的光化学成像系统表现出的高热稳定性允许在像等离子体刻蚀机和离子注入机等设备上以更高的温度进行更快的处理；本发明的开发的光化学成像系统保持高分辨率，即保持锐利、陡峭的图案图像轮廓。
• Positive photoresist thermally stable compositions and elements having
  申请人：Hoechst Celanese Corporation

  公开号：US04857435A1

  公开（公告）日：1989-08-15

  Actinic (deep ultraviolet, ultraviolet and visible) light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of --CO--NH--CO-- groups, such as maleimide and especially maleimide-substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or .alpha.-methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-B in Table I. The present invention also contemplates photosensitive elements and thermally stable photochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photochemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230.degree. C. and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.

  本发明涉及一种深紫外线、紫外线和可见光敏感的阳性光刻胶组合物，其含有一种碱不溶性光活性化合物的混合物，该光活性化合物在暴露于光刻胶中的紫外线后能够转化为碱可溶性物质，其含量足以使混合物相对碱不溶性，并且包括一种聚合物，该聚合物包含足够量的--CO--NH--CO--基团，例如马来酰亚胺和尤其是马来酰亚胺取代的苯乙烯共聚物，使混合物在暴露于光刻胶中的紫外线后易于溶于碱性物质。优选的共聚物包括马来酰亚胺/苯乙烯或α-甲基苯乙烯的1:1摩尔比。适用于对深紫外线敏感的阳性光刻胶组合物的优选光活性化合物具有表I中的18-B式。本发明还涉及基于该光刻胶组合物的光敏元件和热稳定的光化学成像系统。将阳性光刻胶组合物涂覆在基板上，产生光敏元件，该元件在暴露于波长在约200-700 nm范围内的光刻胶图案后产生光化学成像系统，可以用碱性显影剂处理，通过高度选择性地去除暴露区域形成高度分辨率的图案。在显影后，本发明的光化学成像系统的优选实施例在230℃的后烘烤时高度分辨率特征（一微米）在图案图像中几乎不发生变化，之后容易剥离。由本发明的阳性光刻胶组合物形成的光化学成像系统表现出的高热稳定性允许在更高的温度下进行更快速的处理，例如在等离子体刻蚀机和离子注入器等设备上；本发明的开发光化学成像系统保持高分辨率，即保持尖锐、陡峭的图案图像轮廓。
• Positive photoresist compositions having deep UV response, photosensitive elements and thermally stable photochemically imaged systems containing same
  申请人：HOECHST CELANESE CORPORATION

  公开号：EP0140273A2

  公开（公告）日：1985-05-08

  Actinic (deep ultraviolet, ultraviolet and visible light sensitive positive photoresist compositions containing a mixture of an alkali-insoluble photoactive compound capable of being transformed into an alkali-soluble species upon exposure to actinic radiation, in an amount sufficient to render the mixture relatively alkali insoluble and a polymer comprising an amount of tCO-NH-COt groups, such as maleimide and especially maleimide - substituted styrene copolymers, sufficient to render the mixture readily alkali soluble upon exposure to actinic radiation are disclosed. The preferred copolymers include maleimide/styrene or a-methylstyrene in a 1:1 molar ratio. The preferred photoactive compound suitable for a positive photoresist composition responsive to deep UV actinic radiation has the formula 18-8 in Table I. The present invention also contemplates photosensitive elements and thermally stable photochemically imaged systems based on the actinic light sensitive positive photoresist compositions. The positive photoresist compositions are coated onto a substrate to produce a photosensitive element, which upon exposure to a pattern of actinic radiation of wavelength in the range of about 200-700 nm produces a photochemically imaged system that can be treated with an alkaline developer to form highly resolved patterns, by highly selective removal of exposed areas. After development, preferred embodiments of the photochemically images systems exhibit insignificant changes in the highly resolved features (one micron) in the patterned image upon postbaking at temperatures of about 230°C and is, thereafter readily stripped. The high thermal stability exhibited by the photochemically imaged systems formed from the positive photoresist compositions of the present invention allows faster processing at higher temperatures, on equipment like plasma etchers and ion implanters; the developed photochemically imaged systems of the present invention retain high resolution, i.e., retain sharp, steep patterned image profiles.

  本发明公开了阳极（深紫外线、紫外线和可见光敏感的正极光刻胶组合物，该组合物含有一种碱不溶性光活性化合物的混合物，该化合物在暴露于阳极辐射时能够转变成碱溶性物质，其含量足以使该混合物相对碱不溶，还含有一种包含一定量 tCO-NH-COt 基团的聚合物，例如马来酰亚胺，特别是马来酰亚胺-取代苯乙烯共聚物，其含量足以使该混合物在暴露于阳极辐射时容易碱溶解。优选的共聚物包括马来酰亚胺/苯乙烯或 a-甲基苯乙烯，摩尔比为 1:1。适用于对深紫外线辐射有反应的正性光刻胶组合物的优选光活性化合物具有表 I 中的式 18-8。本发明还考虑了基于光敏正性光刻胶组合物的光敏元件和热稳定光化学成像系统。将正性光致抗蚀剂组合物涂在基底上可产生光敏元件，该光敏元件暴露于波长范围约为 200-700 纳米的光辐射图案后，可产生光化学成像系统，该系统可用碱性显影剂处理，通过高度选择性地去除暴露区域，形成高分辨率图案。经过显影后，光化学成像系统的优选实施例在约 230°C 的温度下进行后烘烤时，图案图像中的高分辨率特征（一微米）会出现微小的变化，随后很容易剥离。由本发明的正性光刻胶组合物形成的光化学成像系统具有很高的热稳定性，可以在等离子刻蚀机和离子注入机等设备上以更高的温度进行更快的加工；本发明的光化学成像系统可以保持高分辨率，即保持清晰、陡峭的图案图像轮廓。
• Copolymers useful for the preparation of thermal digital lithographic printing plates
  申请人：Kodak Polychrome Graphics Company Ltd.

  公开号：EP1506983A2

  公开（公告）日：2005-02-16

  A thermally imageable element is disclosed. The element made up of a substrate and a composite layer structure composed of two layer coatings. Preferably, the first layer of the composite is composed of an aqueous developable polymer mixture containing a solubility inhibiting material and a photothermal conversion material which is contiguous to the hydrophilic substrate. The second layer of the composite is insoluble in the aqueous solution, is ink receptive, and is composed of one or more non-aqueous soluble polymers which are soluble or dispersible in a solvent which does not dissolve the first layer. The second layer may also contain a photothermal conversion material. Alternatively, the composite layer may be free of photothermal conversion material when thermal imaging is carried out using a thermal printing head.

  本发明公开了一种热成像元件。该元件由基底和由两层涂层组成的复合层结构构成。复合材料的第一层最好由水性可显影聚合物混合物组成，该混合物含有溶解性抑制材料和光热转换材料，与亲水性基底相邻。复合材料的第二层不溶于水溶液，可接受油墨，由一种或多种非水溶性聚合物组成，这些聚合物可溶于或分散于不溶解第一层的溶剂中。第二层也可以包含光热转换材料。或者，在使用热打印头进行热成像时，复合层可以不含光热转换材料。