Polymer, resist protective coating material, and patterning process
申请人:Hatakeyama Jun
公开号:US20070178407A1
公开(公告)日:2007-08-02
A polymer comprising repeat units having formula (1) wherein R
1
and R
2
are hydrogen or C
1
-C
12
alkyl, or R
1
and R
2
may bond together to form a ring, and R
30
is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.