(4,4,4-trifluoro-3-hydroxy-2-methyl-3-trifluoromethylbutan-2-yloxycarbonyl)-methyl 5-norbornene-2-carboxylate | 1109285-56-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: (4,4,4-trifluoro-3-hydroxy-2-methyl-3-trifluoromethylbutan-2-yloxycarbonyl)-methyl 5-norbornene-2-carboxylate
• 英文别名: [2-Oxo-2-[4,4,4-trifluoro-3-hydroxy-2-methyl-3-(trifluoromethyl)butan-2-yl]oxyethyl] bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 1109285-56-4
• 化学式: C₁₆H₁₈F₆O₅
• 分子量: 404.306
• InChiKey: IECNNJKDPNUDSM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  27
• 可旋转键数：
  7
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  72.8
• 氢给体数：
  1
• 氢受体数：
  11

反应信息

• 作为产物：
  描述：

  5-降冰片烯-2-羧酸 以60%的产率得到(4,4,4-trifluoro-3-hydroxy-2-methyl-3-trifluoromethylbutan-2-yloxycarbonyl)-methyl 5-norbornene-2-carboxylate
  参考文献：
  名称：

  FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS

  摘要：

  式（1）的氟化单体在制备用于辐射敏感抗蚀组合物的聚合物方面很有用。 R1是H或一价的C1-C20碳氢基团，R2是H，F，甲基或三氟甲基，R3和R4是H或一价的C1-C8碳氢基团，或R3和R4可以形成脂肪烃环，A是二价的C1-C6碳氢基团。

  公开号：

  US20090035699A1

文献信息

• Polymer, resist protective coating material, and patterning process
  申请人：Hatakeyama Jun

  公开号：US20070178407A1

  公开（公告）日：2007-08-02

  A polymer comprising repeat units having formula (1) wherein R 1 and R 2 are hydrogen or C 1 -C 12 alkyl, or R 1 and R 2 may bond together to form a ring, and R 30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
• US7642034B2
  申请人：——

  公开号：US7642034B2

  公开（公告）日：2010-01-05
• US7981589B2
  申请人：——

  公开号：US7981589B2

  公开（公告）日：2011-07-19
• FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20090035699A1

  公开（公告）日：2009-02-05

  Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R 1 is H or monovalent C 1 -C 20 hydrocarbon group, R 2 is H, F, methyl or trifluoromethyl, R 3 and R 4 are H or a monovalent C 1 -C 8 hydrocarbon group, or R 3 and R 4 may form an aliphatic hydrocarbon ring, and A is a divalent C 1 -C 6 hydrocarbon group.

  式（1）的氟化单体在制备用于辐射敏感抗蚀组合物的聚合物方面很有用。 R1是H或一价的C1-C20碳氢基团，R2是H，F，甲基或三氟甲基，R3和R4是H或一价的C1-C8碳氢基团，或R3和R4可以形成脂肪烃环，A是二价的C1-C6碳氢基团。