1-ethoxyethyl ether of lactic acid | 162845-25-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-ethoxyethyl ether of lactic acid
• 英文别名: 2-(1-Ethoxyethoxy)propanoic acid
• CAS: 162845-25-2
• 化学式: C₇H₁₄O₄
• 分子量: 162.186
• InChiKey: FRGRNGNKLISCCU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  11
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  55.8
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials, LLC

  公开号：US20160002199A1

  公开（公告）日：2016-01-07

  Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。首选的酸发生剂包括含有共价连接的酸敏感基团的环状硫铵化合物。
• ANTIREFLECTIVE COMPOSITIONS WITH THERMAL ACID GENERATORS
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20190085173A1

  公开（公告）日：2019-03-21

  New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.

  提供了包括一个或多个热酸发生剂的防反射组分的新方法和基板。
• ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160347709A1

  公开（公告）日：2016-12-01

  Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。在一个首选方面，提供了包含一个或多个亲水性基团的酸发生剂。
• PHOTOBASE GENERATORS AND PHOTORESIST COMPOSITIONS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20160334703A1

  公开（公告）日：2016-11-17

  New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X 1 —R 1 —O—C(═O)N(R 2 )R 3 (I) wherein X 1 is an optionally substituted aromatic group; R 1 is a linker; and R 2 and R 3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R 2 and R 3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.

  提供了适用于光刻胶的新型光刻底物生成物，对应于式（I）：X1—R1—O—C(═O)N(R2)R3（I）其中X1是可选择取代的芳香族基团；R1是连接基团；R2和R3是相同或不同的可选择取代的线性、支链或环烷基基团或可选择取代的芳香族基团，其中R2和R3中至少有一个是具有4个或更多碳原子的可选择取代的支链烷基基团。
• COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20170059991A1

  公开（公告）日：2017-03-02

  Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):

  有机涂层组合物，特别是用于与覆盖光阻的抗反射涂层组合物，其包括包括以下化学式（I）结构的交联剂组分。