5,6-二甲基苯并三唑水合物 | 1049746-27-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并三唑类
• 中文名称: 5,6-二甲基苯并三唑水合物
• 英文名称: 5,6-dimethylbenzotriazole hydrate
• 英文别名: 5,6-Dimethyl-1H-Benzotriazole Hydrate；5,6-dimethyl-2H-benzotriazole;hydrate
• CAS: 1049746-27-1
• 化学式: C₈H₉N₃*H₂O
• 分子量: 165.195
• InChiKey: VVWPOQUENPOMAK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.75
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  42.6
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  RuH₂(CO)(PPh₃)₃ 、 5,6-二甲基苯并三唑水合物 以 苯 为溶剂， 以74%的产率得到carbonylhydrido{hydrogenbis(5,6-dimethylbenzotriazolato)}bis(triphenylphosphine)ruthenium
  参考文献：
  名称：

  Olby, Bruce G.; Robinson, Stephen D.; Hursthouse, Michael B., Journal of the Chemical Society, Dalton Transactions

  摘要：

  DOI：

文献信息

• Coating composition for interconnection part of electrode and plasma display panel including the same
  申请人：Samsung SDI Co., Ltd.

  公开号：EP2014797A2

  公开（公告）日：2009-01-14

  Provided are a coating composition for an interconnection part of an electrode and a plasma display panel including the same. Specifically, the coating composition for an interconnection part of an electrode, comprising 0.05 to 2.0 parts by weight of a compound containing a triazole group, 3.5 to 7.5 parts by weight of a silane based compound, and 0.5 to 2.0 parts by weight of a transition metal oxide, is used to effectively prevent opens and short circuits of an electrode due to damage of an interconnection unit caused by gases and humidity in the surrounding environment and due to a migration phenomenon.

  本发明提供了一种用于电极互连部分的涂层组合物以及包括该组合物的等离子显示面板。具体来说，电极互连部分的涂层组合物由 0.05 至 2.0 份（按重量计）含三唑基团的化合物、3.5 至 7.5 份（按重量计）硅烷基化合物和 0.5 至 2.0 份（按重量计）过渡金属氧化物组成，用于有效防止因周围环境中的气体和湿度以及迁移现象造成互连单元损坏而导致的电极开路和短路。
• Olby, Bruce G.; Robinson, Stephen D.; Hursthouse, Michael B., Journal of the Chemical Society, Dalton Transactions
  作者：Olby, Bruce G.、Robinson, Stephen D.、Hursthouse, Michael B.、Short, Richard L.

  DOI：——

  日期：——
• Compositions d'enregistrement thermographique les contenant et supports correspondants
  申请人：AUSSEDAT-REY

  公开号：EP0069685B1

  公开（公告）日：1986-09-17
• PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20220229366A1

  公开（公告）日：2022-07-21

  Disclosed herein is a pattern formation method, comprising (a) applying a layer of a photoresist composition over a semiconductor substrate, (b) pattern-wise exposing the photoresist composition layer to i-line radiation; and (c) developing the exposed photoresist composition layer to provide a resist relief image; wherein the photoresist composition comprises a non-ionic photoacid generator; a solvent; a first polymer and a second polymer; and wherein the first polymer comprises a polymeric dye.
• US4359397A
  申请人：——

  公开号：US4359397A

  公开（公告）日：1982-11-16