Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
申请人:JSR CORPORATION
公开号:US11204552B2
公开(公告)日:2021-12-21
A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3.
[AxMR1y] (1)
一种辐射敏感的组合物包括:第一聚合物,具有包括酸敏感基团的第一结构单元;和第一化合物,包括金属阳离子和第一阴离子,该第一阴离子是酸的共轭碱。该酸的pKa不大于0。该酸优选为磺酸,硝酸,有机氮酸,二磺基亚胺酸或其组合物。第一化合物优选由式(1)表示。在式(1)中,M表示金属阳离子; A表示第一阴离子; x为1至6的整数; R1表示σ配体; y为0至5的整数,且总和:x+y不大于6。该酸的范德华体积优选不小于2.5×10−28 m3。[AxMR1y] (1)