RESIST MATERIAL FOR IMPRINTING, PATTERN FORMATION METHOD, AND IMPRINTING APPARATUS
申请人:KAWAMURA Daisuke
公开号:US20130059090A1
公开(公告)日:2013-03-07
According to one embodiment, an resist material for imprinting comprises a first resin component nonvolatile at a substrate on which to form an imprinting pattern, a second resin component volatile at the substrate, and a coupling reaction initiator that promotes curing of the first resin component.