POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME
申请人:Takemoto Ichiki
公开号:US20090220886A1
公开(公告)日:2009-09-03
The present invention provides a polyhydric compound represented by the formula (I):
wherein R
51
to R
67
each independently represent a hydrogen atom etc., at least one selected from the group consisting of R
1
to R
5
is a group represented by the formula (II):
wherein Q
1
and Q
2
each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A
+
represents an organic counter ion, and
the others are hydrogen atoms or groups represented by the formula (III):
wherein X
1
to X
4
each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups:
Z
1
represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and
a chemically amplified resist composition containing the same.