申请人:Mitsubishi Chemical Corporation
公开号:EP0619520A1
公开(公告)日:1994-10-12
A photopolymerizable composition comprising at least an addition polymerizable compound and a photopolymerization initiator system, wherein the addition polymerizable compound has at least one ethylenically unsaturated double bond, and the photopolymerization initiator system comprises (a) a sensitizer of the following formula (I):
wherein each of R¹ to R⁶ is a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an aralkyl group, an acyl group, an alkoxycarbonyl group, a substituted or unsubstituted hydrocarbon ring residue, a substituted or unsubstituted heterocyclic residue, or -SO₃-R⁸, wherein R⁸ is a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, an alkali metal atom or a quaternary ammonium group, R⁷ is a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, a substituted or unsubstituted hydrocarbon ring residue, or a substituted or unsubstituted heterocyclic residue, each of X¹ and X² is a halogen atom, an alkyl group, an aryl group, an aralkyl group, a substituted or unsubstituted hydrocarbon ring residue, or a substituted or unsubstituted heterocyclic group, and (b) a titanocene compound capable of generating radicals when irradiated in the presence of the sensitizer.
一种可光聚合的组合物,至少包括一种可加成聚合的化合物和一种光聚合引发剂体系,其中可加成聚合的化合物具有至少一个乙烯基不饱和双键,光聚合引发剂体系包括 (a) 下式 (I) 的敏化剂:
其中 R¹ 至 R⁶ 各为氢原子、卤素原子、烷基、芳基、芳烷基、酰基、烷氧羰基、取代或未取代的烃环残基、取代或未取代的杂环残基,或 -SO₃-R⁸,其中 R⁸ 是氢原子、烷基、芳基、芳烷基、碱金属原子或季铵基,R⁷ 是氢原子、烷基、芳基、芳烷基、芳烷基、酰基、烷氧羰基、取代或未取代的烃环残基、取代或未取代的杂环残基,或 -SO₃-R⁸、X¹和 X² 各为卤素原子、烷基、芳基、芳烷基、取代或未取代的烃环残基或取代或未取代的杂环残基,以及 (b) 在敏化剂存在下照射时能够产生自由基的二茂钛化合物。