SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20160097973A1
公开(公告)日:2016-04-07
The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1) and having a weight average molecular weight of 3,000 to 500,000. There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate when the widely used 2.38% TMAH aqueous solution is used as a developer.
本发明提供了一种含有硅骨架的聚合物化合物,其包含由通式(1)所示的重复单元,并具有3,000至500,000的重均分子量。可以提供一种适用于化学增强负型光阻组合物的基础树脂的硅骨架聚合物化合物,该组合物可以纠正在金属线路(如Cu和Al)、电极和基板(尤其是在SiN基板上)上产生的剥离问题,并且可以在使用广泛使用的2.38%TMAH水溶液作为显影剂时,在图案底部和基板上不生成污染物和足型轮廓的情况下形成细小的图案。