Plasma developable negative resist compositions for electron beam, X-ray and optical lithography
申请人:TEXAS INSTRUMENTS INCORPORATED
公开号:EP0130088A2
公开(公告)日:1985-01-02
A negative resist composition including a polymeric matrix material, a polymerizable monomer, and an onium salt radiation sensitive initiator. The monomer is polymerized by irradiating the resist with an e-beam, x-ray, or ultraviolet source and heating the exposed resist. The resist is developed by a dry etchant such as plasma or a reactive ion etchant.
一种阴性抗蚀剂组合物,包括聚合物基体材料、可聚合单体和铟盐辐射敏感引发剂。 用电子束、X 射线或紫外线源照射抗蚀剂并加热暴露的抗蚀剂,使单体聚合。 抗蚀剂通过干蚀刻剂(如等离子体或活性离子蚀刻剂)显影。