Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US11131927B2
公开(公告)日:2021-09-28
A chemically amplified positive-type photosensitive resin composition which is highly sensitive and in which it is easy to form a resist pattern whose cross-sectional shape is rectangular, a photosensitive dry film which includes a photosensitive resin layer formed from the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition and a method of manufacturing a plated article using the substrate with the template. A Lewis acid compound is included in the composition that also includes an acid generator which generates an acid by application of an active ray or radiation, and a resin whose solubility in alkali is increased by action of an acid.
一种化学放大的正型光敏树脂组合物,它具有高灵敏度,并且易于形成横截面形状为矩形的抗蚀剂图案;一种光敏干膜,它包括由该组合物形成的光敏树脂层;一种制造光敏干膜的方法;一种使用该组合物制造图案抗蚀膜的方法;一种使用该组合物制造带有模板的基片的方法;以及一种使用带有模板的基片制造电镀物品的方法。组合物中包含一种路易斯酸化合物,该组合物还包括一种酸发生器(通过应用活性射线或辐射产生一种酸)和一种树脂(通过酸的作用增加其在碱中的溶解度)。