Insertion of Sulfur Trioxide into the N–Si Bond of Anilinotrimethylsilane. An Improved Method for the Preparation of Free Phenylamidosulfuric Acid
作者:Fujio Kanetani、Eiji Okada、Kenji Negoro
DOI:10.1246/bcsj.59.2517
日期:1986.8
anilinotrimethylsilane (1) and a variety of sulfonating agents [SO3, ClSO3H, trimethylsilyl chlorosulfate (5), dioxane–sulfur trioxide complex, ethyl chlorosulfate (10)] has been studied. With SO3, 5, or a dioxane–sulfur trioxide complex a sulfur trioxide molecule was inserted selectively into the N–Si bond of 1 to yield trimethylsilyl phenylamidosulfate (2), which on treatment with acetic acid, trifluoroacetic acid
已经研究了苯胺基三甲基硅烷 (1) 与多种磺化剂 [SO3、ClSO3H、氯硫酸三甲基甲硅烷基酯 (5)、二恶烷-三氧化硫复合物、氯硫酸乙酯 (10)] 之间的反应。使用 SO3、5 或二恶烷 - 三氧化硫络合物,将三氧化硫分子选择性地插入到 1 的 N-Si 键中,生成苯酰胺硫酸三甲基甲硅烷酯 (2),用乙酸、三氟乙酸或甲醇处理后得到游离的苯酰胺硫酸酸(3)。1与ClSO3H反应直接得到3,但产物被少量硫酸氢苯胺和氯化苯胺污染。1与10的反应产生含有二苯胺(4-磺基苯基酰胺基)硫酸盐、4-氨基苯磺酸和苯基酰胺基硫酸乙酯作为主要产物(脱甲硅烷基化后)的混合物。