1-{[(4-methylphenyl)sulfonyl]oxy}pyrrolidine-2,5-dione | 55048-39-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-{[(4-methylphenyl)sulfonyl]oxy}pyrrolidine-2,5-dione
• 英文别名: 2,5-dioxopyrrolidin-1-yl 4-methylbenzenesulfonate；N-succinimidoyloxy tosylate；N-(p-toluenesulfonyloxy)succinimide；O-p-Toluylsulfonyl-N-hydroxysuccinimid；N-Tosyloxysuccinimid；(2,5-dioxopyrrolidin-1-yl) 4-methylbenzenesulfonate
• CAS: 55048-39-0
• 化学式: C₁₁H₁₁NO₅S
• 分子量: 269.278
• InChiKey: XFJSTBHMLYKHJF-UHFFFAOYSA-N

物化性质

• 熔点：
  143-144 °C(Solv: ethyl acetate (141-78-6))
• 沸点：
  412.2±38.0 °C(Predicted)
• 密度：
  1.49±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.27
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  曲酸 、 1-{[(4-methylphenyl)sulfonyl]oxy}pyrrolidine-2,5-dione 在 三乙胺 作用下， 以 1,4-二氧六环 为溶剂， 反应 1.0h， 以92%的产率得到(5-hydroxy-4-oxo-4H-pyran-2-yl)methyl 3-({[(5-hydroxy-4-oxo-4H-pyran-2 yl)methoxy]carbonyl}amino)propanoate
  参考文献：
  名称：

  Kojic-βAla-Kojic对金属配位和酪氨酸酶抑制作用的研究

  摘要：

  曲酸是一种天然的抗真菌和抗菌剂，其酪氨酸酶抑制和金属配位性能已得到广泛研究。酪氨酸酶是一种金属酶，在活性位点具有两个铜离子。曲酸的酪氨酸酶抑制活性与其与金属的配位能力有关，这一点已被广泛接受。在过去的五年中，我们使用曲酸合成了铁和铝的新型高效双曲酸螯合剂。同时，我们研究了从头设计的配体是否会干扰酪氨酸酶的正常功能。本研究将我们的经验与新配体Kojic-βAla-Kojic的抑制和配位研究相结合。旨在组装新型有效酪氨酸酶抑制剂的研究是基于该酶的众所周知的晶体结构。两个问题是，两种曲酸是否能比一种更好地起作用，以及接头的长度和种类可在多大程度上改善金属的配位和抑制活性。我们的结果表明，Kojic-βAla-Kojic对Fe（III），Al（III），Zn（II）和Cu（II）具有高亲和力，并具有强大的酪氨酸酶抑制作用，可建议在工业和制药应用中使用。

  DOI：

  10.1016/j.jinorgbio.2015.07.001
• 作为产物：
  描述：

  N-羟基丁二酰亚胺 、 sodium 4-methylbenzenesulfinate 在 溴化铵 作用下， 以 四氢呋喃 、 水 为溶剂， 反应 1.0h， 以32%的产率得到1-{[(4-methylphenyl)sulfonyl]oxy}pyrrolidine-2,5-dione
  参考文献：
  名称：

  电化学诱导的氧化S-O耦合：从磺酰肼磺酸盐和合成Ñ -hydroxyimides或Ñ -hydroxybenzotriazoles

  摘要：

  开发了在电流作用下的氧化S-O偶联过程。芳基，杂芳基和烷基磺酰基酰肼和Ñ羟基化合物（Ñ -hydroxyimides和Ñ -hydroxybenzotriazoles）应用于作为起始试剂磺酸盐的制备。该反应在恒定电流条件下在实验方便的配有石墨阳极和不锈钢阴极的不分隔电化学电池中在高电流密度（60 mA cm -2）下进行。NH 4在此过程中，Br充当支撑电解质，并参与起始化合物的氧化，以形成偶联产物。制定的策略代表了一种相当有效的原子效率方法：一个配偶体损失两个氮原子和三个氢原子，而另一个伙伴仅损失一个氢原子。循环伏安法和对照实验使我们能够提出可能的反应途径：通过阳极氧化分子溴或其较高氧化态衍生物产生的氧化途径将起始化合物氧化而形成反应性物种，然后形成S-O键。

  DOI：

  10.1039/c8ob03162b

文献信息

• COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20170073288A1

  公开（公告）日：2017-03-16

  The compound according to the present invention is represented by a specific formula. The compound according to the present invention has a structure according to the specific formula, and therefore can be applied to a wet process and is excellent in heat resistance and etching resistance. In addition, the compound according to the present invention has such a specific structure, and therefore has a high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration and also a high solvent solubility. Therefore, the compound according to the present invention can be used to form an underlayer film whose degradation is suppressed at high-temperature baking and which is also excellent in etching resistance to oxygen plasma etching or the like. Furthermore, the compound is also excellent in adhesiveness with a resist layer and therefore can form an excellent resist pattern.

  根据本发明，该化合物由特定的公式表示。根据本发明，该化合物具有特定公式的结构，因此可应用于湿法工艺，具有优异的耐热性和耐蚀性。此外，根据本发明，该化合物具有特定结构，因此具有高耐热性、相对较高的碳浓度、相对较低的氧浓度以及高溶剂溶解性。因此，根据本发明的化合物可用于形成在高温烘烤时降解受抑制且在氧等离子体蚀刻中具有优异耐蚀性的底层膜。此外，该化合物在与光阻层的粘附性方面也表现出色，因此可形成优异的光阻图案。
• Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
  申请人：Watanabe Takeru

  公开号：US20050250924A1

  公开（公告）日：2005-11-10

  Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

  新型含有内酯结构的三元（甲基）丙烯酸酯化合物可聚合成具有改善透明度的聚合物，特别是在准分子激光的照射波长下以及干法刻蚀抗性方面。包括这些聚合物的抗蚀组合物对高能辐射敏感，具有高分辨率，并适用于电子束或深紫外线微图案化。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20180101096A1

  公开（公告）日：2018-04-12

  A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R 1 represents a 2 n -valent group having 1 to 30 carbon atoms, or a single bond, each R 0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m 1 is independently an integer of 0 to 4, in which at least one m 1 is an integer of 1 to 4, each m 2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

  一种用于光刻的底层膜的材料，其中使用以下式(0)代表的化合物。(在式(0)中，每个X独立表示氧原子或硫原子，或非交联状态，R1表示具有1到30个碳原子的2n价基团，或者单键，每个R0独立表示具有1到30个碳原子的直链、支链或环烷基，具有6到30个碳原子的芳基，具有2到30个碳原子的直链、支链或环烯基，硫醇基，卤素基，硝基，氨基，羧基或羟基，烷基、烯基和芳基中每个可选包括氰酸基、硫醇基、卤素基、硝基、氨基、羧基、羟基、醚键、酮键或酯键，每个m1独立地为0到4的整数，其中至少一个m1为1到4的整数，每个m2独立地为0到3的整数，n为1到4的整数，每个p独立地为0或1。)