3,5-di(trifluoroacetoxy)-1-adamantyl methacrylate | 1242906-47-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3,5-di(trifluoroacetoxy)-1-adamantyl methacrylate
• 英文别名: [3,5-Bis[(2,2,2-trifluoroacetyl)oxy]-1-adamantyl] 2-methylprop-2-enoate；[3,5-bis[(2,2,2-trifluoroacetyl)oxy]-1-adamantyl] 2-methylprop-2-enoate
• CAS: 1242906-47-3
• 化学式: C₁₈H₁₈F₆O₆
• 分子量: 444.328
• InChiKey: SHZYBVNDMDVDTC-UHFFFAOYSA-N

物化性质

• 沸点：
  381.6±42.0 °C(Predicted)
• 密度：
  1.45±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  30
• 可旋转键数：
  7
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.72
• 拓扑面积：
  78.9
• 氢给体数：
  0
• 氢受体数：
  12

反应信息

• 作为产物：
  描述：

  2-二甲氨基吡啶 、 (meth)acrylic acid 3,5-dihydroxy-1-adamantyl 、 碳酸氢钠 在 三氟乙酸酐 作用下， 以 乙酸乙酯 为溶剂， 以51%的产率得到3,5-di(trifluoroacetoxy)-1-adamantyl methacrylate
  参考文献：
  名称：

  RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND

  摘要：

  一种辐射敏感的树脂组合物，包括具有以下公式（1）所代表的结构单元的第一聚合物和辐射敏感的酸发生剂。在公式（1）中，RC最好代表具有(n+1)价且具有4至30个碳原子的脂肪族多环烃基团。公式（1）所代表的结构单元最好是由以下公式（1-1）所代表的n的结构单元。

  公开号：

  US20130022912A1

文献信息

• Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
  申请人：JSR CORPORATION

  公开号：US11204552B2

  公开（公告）日：2021-12-21

  A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; R1 represents a σ ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5×10−28 m3. [AxMR1y]  (1)

  一种辐射敏感的组合物包括：第一聚合物，具有包括酸敏感基团的第一结构单元;和第一化合物，包括金属阳离子和第一阴离子，该第一阴离子是酸的共轭碱。该酸的pKa不大于0。该酸优选为磺酸，硝酸，有机氮酸，二磺基亚胺酸或其组合物。第一化合物优选由式（1）表示。在式（1）中，M表示金属阳离子; A表示第一阴离子; x为1至6的整数; R1表示σ配体; y为0至5的整数，且总和：x+y不大于6。该酸的范德华体积优选不小于2.5×10−28 m3。[AxMR1y]  (1)
• POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HARADA Yuji

  公开号：US20110177455A1

  公开（公告）日：2011-07-21

  A polymer comprising recurring units of formula (1) and having a solubility in alkaline developer which increases under the action of an alkaline developer is provided. The polymer has transparency to radiation of up to 200 nm and improved water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer to formulate a resist composition. R 1 is H, F, methyl, or trifluoromethyl, R 2 is a monovalent fluorinated hydrocarbon group, A n is a (n+1)-valent hydrocarbon or fluorinated hydrocarbon group, and n is 1, 2 or 3.
• RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20200117087A1

  公开（公告）日：2020-04-16

  A radiation-sensitive resin composition contains: a first polymer including a first structural unit that includes a phenolic hydroxy group, and a second structural unit that includes an acid-labile group; a second polymer including a fluorine atom, a silicon atom, or both, and including a third structural unit that includes an alkali-labile group; a first compound that generates upon an irradiation with a radioactive ray an acid capable of dissociating the acid-labile group within 1 minute under a temperature T X ° C. of no less than 80° C. and no greater than 130° C.; and a second compound that generates upon an irradiation with a radioactive ray a carboxylic acid, a sulfonic acid, or both, the carboxylic acid and the sulfonic acid each being not capable of substantially dissociating the acid-labile group within 1 minute under the temperature T X ° C.
• US8420292B2
  申请人：——

  公开号：US8420292B2

  公开（公告）日：2013-04-16
• US9760010B2
  申请人：——

  公开号：US9760010B2

  公开（公告）日：2017-09-12