propionic acid ethoxymethyl ester | 54078-53-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: propionic acid ethoxymethyl ester
• 英文别名: Propionsaeure-aethoxymethylester；Methylenglykol-aethylaether-propionat；Aethoxymethyl-propionat；propanoic acid ethoxy-methyl ester；Ethoxymethylpropionat；Propanoic acid ethoxymethyl ester；ethoxymethyl propanoate
• CAS: 54078-53-4
• 化学式: C₆H₁₂O₃
• 分子量: 132.159
• InChiKey: GIXDJNPUPVJXBG-UHFFFAOYSA-N

物化性质

• 沸点：
  149.5-150.5 °C(Press: 756 Torr)
• 密度：
  0.9709 g/cm3

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  9
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

安全信息

• 海关编码：
  2915509000

反应信息

• 作为产物：
  描述：

  sodium proprionate 、 氯甲基乙醚 以95%的产率得到propionic acid ethoxymethyl ester
  参考文献：
  名称：

  Pihlaja, Kalevi; Lampi, Aija, Acta chemica Scandinavica. Series B: Organic chemistry and biochemistry, 1986, vol. 40, # 3, p. 196 - 199

  摘要：

  DOI：

文献信息

• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160130210A1

  公开（公告）日：2016-05-12

  A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R 1 represents a hydrogen atom, a halogen atom or a C 1 to C 6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R 2 represents a C 1 to C 6 perfluoroalkyl group or *—CHR f1 R f2 , * represents a binding site to a carbonyl group, R f1 and R f2 each independently represent a C 1 to C 4 perfluoroalkyl group or R f1 and R f2 may be bonded together with a carbon atom bonded thereto to form a ring, A 1 represents a single bond, a C 1 to C 6 alkanediyl group or **-A 3 -X 1 -(A 4 -X 2 ) a -(A 5 ) b -, ** represents a binding site to an oxygen atom, A 2 , A 3 , A 4 and A 5 each independently represent a C 1 to C 6 alkanediyl group, X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—, a and b each represent 0 or 1, and W 1 represents a C 5 to C 18 divalent alicyclic hydrocarbon group.

  化合物的化学式为（I），包括从该化合物衍生的结构单元的树脂和包括该树脂的抗蚀组合物： 其中R 1 代表氢原子、卤素原子或C 1 到C 6 烷基基团，其中氢原子可以被卤素原子取代，R 2 代表C 1 到C 6 全氟烷基基团或*—CHR f1 R f2 ，*代表与羰基结合位点，R f1 和R f2 各自独立代表C 1 到C 4 全氟烷基基团或R f1 和R f2 可以与结合在一起的碳原子形成环，A 1 代表单键，C 1 到C 6 烷二基基团或**-A 3 -X 1 -(A 4 -X 2 ) a -(A 5 ) b -，**代表与氧原子结合位点，A 2 、A 3 、A 4 和A 5 各自独立代表C 1 到C 6 烷二基基团，X 1 和X 2 各自独立代表—O—、—CO—O—或—O—CO—，a和b各自代表0或1，W 1 代表C 5 到C 18 的二价脂环烃基团。
• NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160145186A1

  公开（公告）日：2016-05-26

  A compound which is non-ionic compound, the compound has a group represented by formula (Ia): wherein R 2 represents a group having a C 3 to C 18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf 1 and Rf 2 each independently represent a C 1 to C 4 perfluoroalkyl group, and * represents a binding site.

  一种非离子化合物，该化合物具有由式(Ia)表示的基团：其中R2代表具有C3到C18脂环烃基团的基团，其中亚甲基基团可以被氧原子或羰基取代，Rf1和Rf2分别独立地代表C1到C4全氟烷基基团，*代表一个结合位点。
• RADIATION-SENSITIVE COLORED COMPOSITION, COLORED CURED FILM, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, LIQUID CRYSTAL DISPLAY APPARATUS, AND METHOD OF PRODUCING DYE
  申请人：USHIJIMA Kenta

  公开号：US20120235099A1

  公开（公告）日：2012-09-20

  The object of the present invention is to provide a radiation-sensitive colored composition which can supress the generation of the contamination of the device. A radiation-sensitive colored composition including: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.

  本发明的目的是提供一种辐射敏感的着色组合物，可以抑制器件的污染产生。一种辐射敏感的着色组合物，包括：（A）一种含有10 ppm至1000 ppm卤离子的染料；（B）一种可聚合化合物；和（C）一种溶剂。
• Process for producing 3-phenyluracil compounds
  申请人：Sumitomo Chemical Company, Limited

  公开号：EP1101761A2

  公开（公告）日：2001-05-23

  The uracil compounds represented by the formula [V]: wherein R1 represents C1-C5 perfluoroalkyl group and Q represents an aromatic group, can be produced by making the amide compounds represented by the formula [II]: wherein R1 and Q have the same meanings defined above, or its hydrate react with a cyanate salt in the presence of a protonic acid.

  由式[V]代表的尿嘧啶化合物：其中 R1 代表 C1-C5 全氟烷基，Q 代表芳香基团，可通过制造由式[II]代表的酰胺化合物（其中 R1 和 Q 具有与上述定义相同的含义）或其水合物，在质子酸存在下与氰酸盐反应制得。
• PHOTOSENSITIVE COMPOSITION REMOVING LIQUID
  申请人：SHOWA DENKO KABUSHIKI KAISHA

  公开号：EP1847878A1

  公开（公告）日：2007-10-24

  A removing solution for photosensitive composition for removal of a pigment-containing photosensitive composition, the solution comprising an alkyleneglycol monoalkyl ether and an aromatic hydrocarbon, as well as one or more solvents selected from among alkyleneglycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters, alicyclic ketones and acetic acid esters. There is provided a photosensitive composition removing solution with excellent photosensitive composition removal performance.

  一种用于去除含颜料感光剂组合物的感光剂组合物去除溶液，该溶液包括亚烷基乙二醇单烷基醚和芳香烃，以及选自亚烷基乙二醇单烷基醚羧酸酯、烷氧基羧酸酯、脂环酮和乙酸酯中的一种或多种溶剂。本发明提供了一种具有优异感光成分去除性能的感光成分去除溶液。