AROMATIC AMINE COMPOUND, CURING AGENT FOR EPOXY COMPOUND, CURABLE COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING AROMATIC AMINE COMPOUND
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20210130284A1
公开(公告)日:2021-05-06
An aromatic amine compound capable of satisfactorily forming a cured product having exceptional alkali resistance by reaction with an epoxy compound; a curing agent for an epoxy compound, the curing agent including the aromatic amine compound; a curable composition including the curing agent for an epoxy compound; a cured product of the curable composition; a method for producing the cured product; and a method for producing the abovementioned aromatic amine compound. The aromatic amine compound has a structure such that a specific position in a central skeleton comprising a fused ring such as a fluorene ring is substituted with a side-chain group including two aromatic groups linked by a flexible bond such as an amide bond, at least one amino group is bonded to the end of the side-chain group, and the structure has no hydroxyl groups.
Provided are compositions useful as dental adhesives comprising an acrylamide compound, a methacrylate base monomer, a polymerization initiator, and a polymerization inhibitor or a polymerization stabilizer.
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
Polymer-supported reagent for the preparation of disulfide-bridged peptides
申请人:Darlak Krzysztof
公开号:US20060047105A1
公开(公告)日:2006-03-02
A reagent for preparation of disulfide-bridged peptides is provided that comprises an oxidative functionality bound to a cross-linked ethoxylate acrylate resin polymer. The reagent has the formula:
wherein circle around (R)} is a cross-linked ethoxylate acrylate resin polymer. Methods of making and using this reagent are also described herein.
Negative-working resist composition for electron beams or X-rays
申请人:FUJI PHOTO FILM CO., LTD.
公开号:US20020192592A1
公开(公告)日:2002-12-19
A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating a sulfonic acid by the irradiation of electron beams or x-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent crosslinking with the resin (B) by the action of an acid, and (D) a compound generating a carboxylic acid having a specific structure by the irradiation of electron beams or x-rays.