4-[(4-Hydroxyphenyl)methyl]benzaldehyde | 1081543-60-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-[(4-Hydroxyphenyl)methyl]benzaldehyde
• 英文别名: 4-[(4-hydroxyphenyl)methyl]benzaldehyde
• CAS: 1081543-60-3
• 化学式: C₁₄H₁₂O₂
• 分子量: 212.248
• InChiKey: QURVCKXUSNURBT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-[(4-Hydroxyphenyl)methyl]benzaldehyde 、 6-alpha,9-alpha-二氟-11-beta,16-alpha,17-alpha,21-四羟基孕甾-1,4-二烯-3,20-二酮 在 三氟甲磺酸 、 magnesium sulfate 作用下， 以 1,4-二氧六环 为溶剂， 反应 24.0h， 生成 (1S,2S,4R,6R,8S,9S,11S,12R,13S,19S)-12,19-difluoro-11-hydroxy-8-(2-hydroxyacetyl)-6-[4-[(4-hydroxyphenyl)methyl]phenyl]-9,13-dimethyl-5,7-dioxapentacyclo[10.8.0.02,9.04,8.013,18]icosa-14,17-dien-16-one
  参考文献：
  名称：

  Design and synthesis of long acting inhaled corticosteroids for the treatment of asthma

  摘要：

  In this Letter we present data for a novel series of ICS for the treatment of asthma. 'Inhalation by design' principles have been applied to a series of highly potent steroidal GR agonists, with a focus on optimising the potential therapeutic index in human. Pharmacokinetic properties were tuned with high intrinsic clearance and low oral bioavailability in mind, to minimise systemic exposure and reduce systemically driven adverse events. High CYP mediated clearance as well as glucuronidation were targeted to achieve high intrinsic clearance coupled with multiple routes of clearance to minimise drug-drug interactions. Furthermore, pharmaceutical properties such as stability, crystallinity and solubility were considered to ensure compatibility with a dry powder inhaler. This work culminated in the identification of the clinical candidate 15, which demonstrates preclinically the desired efficacy and safety profiles confirming its potential as an inhaled agent for the treatment of asthma. (C) 2011 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.bmcl.2011.07.106

文献信息

• Resist underlayer film composition and patterning process using the same
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2476713A1

  公开（公告）日：2012-07-18

  There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

  本发明公开了一种抗蚀剂底层薄膜组合物，其中该组合物含有至少由以下通式（1-1）和/或（1-2）表示的一种或多种化合物和以下通式（2-1）和/或（2-2）表示的一种或多种化合物和/或其等效体缩合而得的聚合物。可以提供一种底层膜组合物，特别是用于三层抗蚀工艺的底层膜组合物，该组合物可以形成反射率降低的底层膜（即作为抗反射膜具有最佳 n 值和 k 值的底层膜）、填充性能优异、图案抗弯曲性能高、蚀刻后尤其是在厚度小于 60 nm 的高纵横向线上不会出现掉线或晃动的底层膜，以及使用该底层膜组合物的图案化工艺。
• RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME
  申请人：OGIHARA Tsutomu

  公开号：US20120184103A1

  公开（公告）日：2012-07-19

  There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), and one or more kinds of compounds, represented by the following general formulae (2-1) and/or (2-2), and/or equivalent bodies thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
• US8853031B2
  申请人：——

  公开号：US8853031B2

  公开（公告）日：2014-10-07
• Design and synthesis of long acting inhaled corticosteroids for the treatment of asthma
  作者：David S. Millan、Stephen A. Ballard、Sara Chunn、Joseph A. Dybowski、Craig K. Fulton、Paul A. Glossop、Edouard Guillabert、Christopher A. Hewson、Rhys M. Jones、David J. Lamb、Carolyn M. Napier、Toby A. Payne-Cook、Emmanuelle R. Renery、Matthew D. Selby、Michelle F. Tutt、Michael Yeadon

  DOI：10.1016/j.bmcl.2011.07.106

  日期：2011.10

  In this Letter we present data for a novel series of ICS for the treatment of asthma. 'Inhalation by design' principles have been applied to a series of highly potent steroidal GR agonists, with a focus on optimising the potential therapeutic index in human. Pharmacokinetic properties were tuned with high intrinsic clearance and low oral bioavailability in mind, to minimise systemic exposure and reduce systemically driven adverse events. High CYP mediated clearance as well as glucuronidation were targeted to achieve high intrinsic clearance coupled with multiple routes of clearance to minimise drug-drug interactions. Furthermore, pharmaceutical properties such as stability, crystallinity and solubility were considered to ensure compatibility with a dry powder inhaler. This work culminated in the identification of the clinical candidate 15, which demonstrates preclinically the desired efficacy and safety profiles confirming its potential as an inhaled agent for the treatment of asthma. (C) 2011 Elsevier Ltd. All rights reserved.