(Z)-2,2,2-trifluoro-1-(4-methoxyphenyl)ethan-1-one oxime | 92512-69-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚醚
• 英文名称: (Z)-2,2,2-trifluoro-1-(4-methoxyphenyl)ethan-1-one oxime
• 英文别名: 1-(4-methoxyphenyl)-1-hydroximino-2,2,2-trifluoroethane；2,2,2-trifluoro-1-(4-methoxyphenyl)-ethanone oxime；alpha,alpha,alpha-Trifluoro-4'-methoxyacetophenone (E)-oxime；(NZ)-N-[2,2,2-trifluoro-1-(4-methoxyphenyl)ethylidene]hydroxylamine
• CAS: 92512-69-1
• 化学式: C₉H₈F₃NO₂
• 分子量: 219.163
• InChiKey: GTIRHANHGLHLIQ-JYRVWZFOSA-N

物化性质

• 沸点：
  240.8±40.0 °C(Predicted)
• 密度：
  1.28±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  41.8
• 氢给体数：
  1
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  (Z)-2,2,2-trifluoro-1-(4-methoxyphenyl)ethan-1-one oxime 以90%的产率得到
  参考文献：
  名称：

  Hatanaka Yasumaru, Hashimoto Makoto, Kurihara Hiroko, Nakayama Hitoshi, K+, J. Org. Chem, 59 (1994) N 2, S 383-387

  摘要：

  DOI：
• 作为产物：
  描述：

  2,2,2-三氟-4-甲氧基乙酰苯 以95%的产率得到
  参考文献：
  名称：

  Hatanaka Yasumaru, Hashimoto Makoto, Kurihara Hiroko, Nakayama Hitoshi, K+, J. Org. Chem, 59 (1994) N 2, S 383-387

  摘要：

  DOI：

文献信息

• Oxime derivatives and the use thereof as latent acids
  申请人：Ciba Specialty Chemicals Corporation

  公开号：US06512020B1

  公开（公告）日：2003-01-28

  Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.

  式I、II和III的化合物，其中R1例如是氢、C1-C12烷基、C3-C30环烷基、C2-C12烯基、C4-C8环烯基、苯基（未取代或取代）、萘基、蒽基或菲基（未取代或取代）、未取代或取代的杂环芳基；其中除氢外，所有基团R1还可以通过具有—O—C键或—O—Si键的基团取代，该基团在酸的作用下断裂；R′1例如是苯基、萘基、二苯基或氧二苯基，这些基团未取代或取代；R2是卤素或C1-C10卤代烷基；R3例如是C1-C18烷基磺酰基、苯基磺酰基、萘基磺酰基、蒽基磺酰基或菲基磺酰基，这些基团未取代或取代，或者R3例如是C2-C6卤代烷酰基或卤苯甲酰基，R′3例如是苯基二磺酰基、萘基二磺酰基、二苯基二磺酰基或氧二苯基二磺酰基，这些基团未取代或取代，X是卤素；在化学增感胶的配方中，这些化合物特别适用作为光敏酸供体。
• Sulfonate derivatives and the use thereof as latent acids
  申请人：Matsumoto Akira

  公开号：US20050153244A1

  公开（公告）日：2005-07-14

  Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X 0 is —[CH 2] h —X or —CH═CH 2 ; h is 2, 3, 4, 5 or 6; R 1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R 1 , when n is 2, is for example optionally substituted phenylene or naphthylene; R 2 for example has one of the meanings of R 1 ; X is for example —OR 20 , —NR 21 R 22 , —SR 23 ; X′ is —X 1 -A 3 -X 2 —; X 1 and X 2 are for example —O—, —S— or a direct bond; A 3 is e.g. phenylene; R 3 has for example one of the meanings given for R 1 ; R 4 has for example one of the meaning given for R 2 ; R 5 and R 6 e.g. are hydrogen; G i.a. is —S— or —O—; R 7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R 8 and R 9 e.g. are C 1 -C 18 alkyl; R 10 has one of the meanings given for R 7 ; R 11 i.a. is C 1 -C 18 alkyl; R 12 , R 13 , R 14 , R 15 R 16 , R 17 and R 18 for example are hydrogen or C 1 -C 18 alkyl; R 20 , R 21 , R 22 and R 23 i.a are phenyl or C 1 -C 18 alkyl; give high resolution with good resist profile.

  化学增感光阻剂组合物包括：(a)一种在酸的作用下固化或其溶解度在酸的作用下增加的化合物；和(b)式(Ia)、(Ib)、(IIa)、(IIb)、(IIIa)、(IIIb)、(Iva)、(Ivb)、(Va)、(Vb)或(VIa)的化合物，其中n为1或2；m为0或1；X0为—[CH2]h—X或—CH═CH2；h为2、3、4、5或6；当n为1时，R1例如为可选取代的苯基、萘基、蒽基、菲基或杂环芳基；当n为2时，R1例如为可选取代的苯基或萘基；R2例如具有R1的其中一种含义；X例如为—OR20、—NR21R22、—SR23；X′为—X1-A3-X2—；X1和X2例如为—O—、—S—或直接键；A3例如为苯基；R3例如具有R1给出的其中一种含义；R4例如具有R2给出的其中一种含义；R5和R6例如为氢；G例如为—S—或—O—；当n为1时，R7例如为可选取代的苯基，当n为2时，例如为苯基；R8和R9例如为C1-C18烷基；R10具有R7给出的其中一种含义；R11例如为C1-C18烷基；R12、R13、R14、R15、R16、R17和R18例如为氢或C1-C18烷基；R20、R21、R22和R23例如为苯基或C1-C18烷基；具有良好的抗蚀性能和高分辨率。
• SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS
  申请人：BASF SE

  公开号：EP1472576B1

  公开（公告）日：2013-04-24
• US4530716A
  申请人：——

  公开号：US4530716A

  公开（公告）日：1985-07-23
• US4566901A
  申请人：——

  公开号：US4566901A

  公开（公告）日：1986-01-28