1-adamantanesulfonic acid | 81619-32-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 1-adamantanesulfonic acid
• 英文别名: Adamantane-1-sulfonic Acid
• CAS: 81619-32-1
• 化学式: C₁₀H₁₆O₃S
• 分子量: 216.301
• InChiKey: QPHBUJJTFKRYHM-UHFFFAOYSA-N

物化性质

• 密度：
  1.37±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  adamantanesulfinyl chloride 在 sodium hydroxide 、 双氧水 作用下， 生成 1-adamantanesulfonic acid
  参考文献：
  名称：

  Stetter,H. et al., Chemische Berichte, 1969, vol. 102, p. 3361 - 3363

  摘要：

  DOI：

文献信息

• Beta-cyclodextrin dimers and phthalocyanines and uses thereof
  申请人：——

  公开号：US20030134824A1

  公开（公告）日：2003-07-17

  The invention provides &bgr;-cyclodextrin dimers and phthalocyanines which can be used in photodynamic therapy of cancer.

  这项发明提供了可用于癌症光动力疗法的β-环糊精二聚体和酞菁化合物。
• RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170371241A1

  公开（公告）日：2017-12-28

  A resist composition containing a resin component having a structural unit represented by general formula (a0-1), and a compound represented by general formula (b1). In general formula (a0-1), R is a hydrogen atom, an alkyl group, or a halogenated alkyl group. Va 1 is a divalent hydrocarbon group. n a1 represents an integer of 0 to 2. Ra′ 12 and Ra′ 13 are a monovalent chain saturated hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom. Ra′ 14 is a phenyl group, a naphthyl group, or an anthryl group. In general formula (b1), R b1 represents a cyclic hydrocarbon group. Y b1 represents a divalent linking group containing an ester bond. V b1 represents an alkylene group, a fluorinated alkylene group, or a single bond. m is an integer of 1 or more, and M m+ is an m-valent organic cation.

  一种电阻组分，包含具有一般式（a0-1）所代表的结构单元的树脂组分，以及一种由一般式（b1）所代表的化合物。在一般式（a0-1）中，R是氢原子、烷基或卤代烷基。Va1是双价碳氢基团。na1表示0至2的整数。Ra′12和Ra′13是具有1至10个碳原子的单价链饱和碳氢基团或氢原子。Ra′14是苯基、萘基或蒽基。在一般式（b1）中，Rb1代表环烃基。Yb1代表含有酯键的双价连接基团。Vb1代表烷基、氟化烷基或单键。m是1或更多的整数，Mm+是m价有机阳离子。
• Process for preparing organic sulfur acids or salts thereof
  申请人：——

  公开号：US20020161255A1

  公开（公告）日：2002-10-31

  A process for producing organic sulfur acid or a salt thereof of the present invention allows an organic substrate to react with a sulfur oxide in the presence of a metallic compound catalyst and in the absence of N-hydroxy and N-oxo cyclic imide compounds and thereby yields a corresponding organic sulfur acid or a salt thereof. Such organic substrates include, for example, (a) homocyclic or heterocyclic compounds having a methylene group, (b) compounds having a methine carbon atom, (c) compounds having a methyl group or methylene group at the adjacent position to an unsaturated bond, (d) non-aromatic heterocyclic compounds having a carbon-hydrogen bond at the adjacent position to a hetero atom, and (e) straight-chain alkanes. The sulfur oxide includes, for example, sulfur dioxide. This production process can efficiently produce an organic sulfur acid or a salt thereof under mild conditions.

  本发明的有机硫酸或其盐的生产方法允许有机底物在金属化合物催化剂存在下与硫氧化物反应，而无需N-羟基和N-氧代环亚酰胺化合物，并因此产生相应的有机硫酸或其盐。这样的有机底物包括，例如，(a) 具有亚甲基基团的同环或异环化合物，(b) 具有亚甲基碳原子的化合物，(c) 在不饱和键相邻位置具有甲基基团或亚甲基基团的化合物，(d) 具有相邻位置至杂原子处的碳氢键的非芳香杂环化合物，以及(e) 直链烷烃。硫氧化物包括，例如，二氧化硫。这种生产方法可以在温和条件下高效地生产有机硫酸或其盐。
• SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20100143830A1

  公开（公告）日：2010-06-10

  A sulfonium salt has formula (1) wherein R 1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R 2 , R 3 , and R 4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.

  一种硫铵盐的化学式为（1），其中R1是一种一价碳氢基团，但不包括乙烯基和异丙烯基，R2、R3和R4是烷基、烯基、氧代烷基、芳基、芳基烷基或芳基氧代烷基，或者它们可以相互连接形成与硫原子的环，并且n为1至3。包含该硫铵盐的化学增感抗剂组合物能够由于高分辨率、改善的焦距宽度、以及在长时间PED后最小化线宽变化和剖面降解而形成良好剖面的精细特征图案。
• RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170176855A1

  公开（公告）日：2017-06-22

  A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including a compound (B1) represented by general formula (b1) shown below (in general formula (b1), R b1 represents a bridged alicyclic group having 7 to 30 carbon atoms and containing a polar group; Y b1 represents a linear hydrocarbon group of 9 or more carbon atoms which may have a substituent excluding at least one member selected from the group consisting of an aromatic hydrocarbon group and a vinyl group; V b1 represents a fluorinated alkylene group; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m). R b1 —Y b1 —V b1 —SO 3 − (M m+ ) 1/m (b1)

  一种抗蚀组合物，在暴露后产生酸，并在酸的作用下在显影溶液中表现出改变的溶解度，包括在酸的作用下在显影溶液中表现出改变的溶解度的基组分（A）和在暴露后产生酸的酸生成组分（B），其中酸生成组分（B）包括下面所示的一般式（b1）表示的化合物（B1）（在一般式（b1）中，Rb1代表具有7至30个碳原子并含有极性基团的桥环脂环基团；Yb1代表具有9个或更多碳原子的线性烃基团，可能具有一个取代基，但不包括由芳香烃基团和乙烯基组成的至少一种成员；Vb1代表氟代烷基烯基团；m表示1或更多的整数；Mm+代表价数为m的有机阳离子）。Rb1—Yb1—Vb1—SO3−(Mm+)1/m（b1）