pyridinium 4-chlorobenzenesulfonate | 35380-50-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: pyridinium 4-chlorobenzenesulfonate
• 英文别名: 4-chlorobenzenesulfonic acid pyridinium salt；Pyridinium-p-chlorphenylsulfonat；4-Chlorobenzenesulfonate;pyridin-1-ium；4-chlorobenzenesulfonate;pyridin-1-ium
• CAS: 35380-50-8
• 化学式: C₅H₅N*C₆H₅ClO₃S
• 分子量: 271.724
• InChiKey: UWZXNJHRAMZMSD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.67
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  75.6
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  pyridinium 4-chlorobenzenesulfonate 、 2,4,6-三氯苯酚 在 trifluoromethanesulfonic acid anhydride 、 三苯基氧化膦 、 三乙胺 作用下， 以 二氯甲烷 为溶剂， 反应 0.33h， 以80%的产率得到4-chlorobenzenesulfonic acid 2,4,6-trichlorophenyl ester
  参考文献：
  名称：

  Trichlorophenol (TCP) sulfonate esters: A selective alternative to pentafluorophenol (PFP) esters and sulfonyl chlorides for the preparation of sulfonamides

  摘要：

  在常规加热和微波辐照条件下，2,4,6-三氯苯酚 (TCP) 磺酸酯会发生有效的氨基溶解；这些物质的反应活性使得全氟辛基磺酸酯的化学选择性转化得以实现。

  DOI：

  10.1039/b614604j
• 作为产物：
  描述：

  吡啶 、 4-氯苯磺酸 以 甲苯 为溶剂， 以89%的产率得到pyridinium 4-chlorobenzenesulfonate
  参考文献：
  名称：

  硼亚酞菁硼的假卤化物

  摘要：

  报道了一系列的亚酞菁硼硼（BsubPc）假卤化物的合成和研究。已将每种假卤化物与更常见的BsubPc氯化物和溴化物进行了比较，并且我们发现大多数假卤化物在标准苯氧基化和水解条件下反应较慢。三种假卤化物（TsO-BsubPc，MsO-BsubPc和BsO-BsubPc）即使在存在水的情况下经过较长时间也不会水解。获得了TsO-，MsO-和ClsO-BsubPc的单晶，并明确确定了它们的结构。

  DOI：

  10.1021/jo202365x
• 作为试剂：
  描述：

  5,5-二甲基-1-吡咯啉-N-氧化物 、 naphthalen-1-yl 2-methyloxirane-2-carboxylate 在 pyridinium 4-chlorobenzenesulfonate 、 C₉₆H₈₆Cl₂N₂O₂Ti 、 锌 作用下， 以 四氢呋喃 、 乙腈 为溶剂， 生成
  参考文献：
  名称：

  通过环氧化物的催化对映异构烯丙基化形成四元立构中心

  摘要：

  用于合成全碳四元立构中心的催化和对映选择性转化的发展长期以来被认为是有机合成中的重大挑战。尽管在不对称烯丙基化方面已经取得了相当大的进展，但它们对常用合成子环氧化物进行官能化的潜力仍然很大程度上尚未得到充分开发。在这里，我们展示了环氧化物的第一个高度区域和对映选择性烯丙基化，在面对潜在问题的消除和质子化反应时，它提供了一系列四元立构中心。该反应在温和条件下通过自由基方法进行，并受益于使用地球丰富的钛和高度复杂的萨伦配体，这有利于显着的对映体控制并抑制不需要的副反应。所得的烯丙基化产物是多功能构件，可以通过化学和立体选择性的方式精细加工成广泛的立体定义的结构基序。

  DOI：

  10.1021/jacs.3c08188

文献信息

• PROCESS FOR PRODUCTION OF BIS-QUATERNARY AMMONIUM SALT, AND NOVEL INTERMEDIATE
  申请人：Okamoto Kuniaki

  公开号：US20120130107A1

  公开（公告）日：2012-05-24

  Object To provide a method for producing a bis-quaternary ammonium salt efficiently and a novel synthetic intermediate thereof. Solution The present invention relates to a method for producing a bis-quaternary ammonium salt represented by a general formula [3] which comprises reacting a disulfonic acid ester represented by a general formula [1] (in the formula, definitions of two R 1 's and T are as described in claim 1 ) with a tertiary amine represented by a general formula [2] (in the formula, definitions of R 3 to R 5 are as described in claim 1 ), and a disulfonic acid ester represented by a general formula [1′] (in the formula, two R 16 's represent independently a halogen atom or a C1-C3 fluoroalkyl group, and two m's represent independently an integer of 1 to 5).

  提供一种高效生产双季铵盐和其新型合成中间体的方法。本发明涉及一种生产由通用式[3]表示的双季铵盐的方法，包括将由通用式[1]表示的二磺酸酯（在该式中，两个R1和T的定义如权利要求1中所述）与由通用式[2]表示的三级胺（在该式中，R3到R5的定义如权利要求1中所述）以及由通用式[1']表示的二磺酸酯（在该式中，两个R16独立表示卤原子或C1-C3氟烷基，两个m独立表示1至5的整数）反应。
• Novel disulfonic acid ester as an additive for an electrolyte for a lithium secondary battery
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP2821395A2

  公开（公告）日：2015-01-07

  Object To provide a method for producing a bis-quaternary ammonium salt efficiently and a novel synthetic intermediate thereof. Solution The present invention relates to a method for producing a bis-quaternary ammonium salt represented by a general formula [3] which comprises reacting a disulfonic acid ester represented by a general formula [1] (in the formula, definitions of two R1's and T are as described in Claim 1) with a tertiary amine represented by a general formula [2] (in the formula, definitions of R3 to R5 are as described in Claim 1), and a novel disulfonic acid ester represented by a general formula [1'] (in the formula, two R16's represent independently a halogen atom or a C1-C3 fluoroalkyl group, and two m's represent independently an integer of 1 to 5) as an additive for an electrolyte for a lithium secondary battery.

  目的 提供一种高效生产双季铵盐的方法及其新型合成中间体。 本发明涉及一种生产通式[3]代表的双季铵盐的方法，该方法包括将通式[1]代表的二磺酸酯（式中，两个 R1 和 T 的定义如权利要求 1 所述）与通式[2]代表的叔胺（式中、R3至R5的定义如权利要求1所述），以及通式[1']代表的新型二磺酸酯（式中，两个R16独立地代表卤素原子或C1-C3氟烷基，两个m独立地代表1至5的整数），作为锂二次电池电解液的添加剂。
• COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170371242A1

  公开（公告）日：2017-12-28

  The object of the present invention is to provide resist underlayer film-forming composition for forming resist underlayer film usable as hard mask and removable by wet etching process using chemical solution such as sulfuric acid/hydrogen peroxide. A resist underlayer film-forming composition for lithography comprises a component (A) and component (B), the component (A) includes a hydrolyzable silane, hydrolysis product thereof, or hydrolysis-condensation product thereof, the hydrolyzable silane includes hydrolyzable silane of Formula (1):R 1 a R 2 b Si(R 3 ) 4−(a+b) (where R 1 is organic group of Formula (2): and is bonded to silicon atom through a Si—C bond; R 3 is an alkoxy group, acyloxy group, or halogen group; is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3), and the component (B) is cross-linkable compound having ring structure having alkoxymethyl group or hydroxymethyl group, cross-linkable compound having epoxy group or blocked isocyanate group.
• SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ORGANIC GROUP HAVING DIHYDROXY GROUP
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20190265593A1

  公开（公告）日：2019-08-29

  There is provided a silicon-containing resist underlayer film that is usable as a hard mask in a lithography process and can be removed by a wet process using a chemical solution, and particularly, a mixed aqueous solution of sulfuric acid with hydrogen peroxide (SPM). A resist underlayer film-forming composition is represented by comprising a hydrolysis-condensation of a hydrolysable silane having an epoxy group in an amount of 10 to 90% by mole relative to the total amount of hydrolysable silanes by an aqueous solution of an alkaline substance, and in a reaction system containing the hydrolysis-condensate, a hydrolysis-condensate containing an organic group having a dihydroxy group obtained by ring-opening the epoxy group by an inorganic acid or a cation exchange resin is further comprised. A resist underlayer film is obtained by applying the resist underlayer film-forming composition to a substrate and baking the composition, the resist underlayer film being capable of being removed by an aqueous solution containing sulfuric acid and hydrogen peroxide at a mass ratio of H 2 SO 4 :H 2 O 2 of 1:1 to 4:1.
• US8716513B2
  申请人：——

  公开号：US8716513B2

  公开（公告）日：2014-05-06