N,N-Di-n-butylaminopentafluorbenzol | 54099-26-2

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N,N-Di-n-butylaminopentafluorbenzol
• 英文别名: N.N-Dibutylpentafluoranilin；N,N-dibutyl-2,3,4,5,6-pentafluoroaniline
• CAS: 54099-26-2
• 化学式: C₁₄H₁₈F₅N
• 分子量: 295.296
• InChiKey: AZVYMXORZQWDNL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  20
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  3.2
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  六氟苯 、 二正丁胺 在 [{(MeCN-2,6-ⁱPr₂C₆H₃)₂CH}Mg(2,2,6,6-tetramethylpiperidine)] 作用下， 以 四氢呋喃 为溶剂， 反应 1.0h， 以18%的产率得到N,N-Di-n-butylaminopentafluorbenzol
  参考文献：
  名称：

  Magnesium-mediated arylation of amines via C–F bond activation of fluoroarenes

  摘要：

  利用结构明确定的β-二酮亚胺稳定的镁胺的高亲核能力，引入了一种通过快速活化氟芳烃的C-F键实现胺芳基化的新方法。

  DOI：

  10.1039/c9cc01670h

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• Olefin polymerization cocatalysts derived from group-15 cationic compounds and processes using them
  申请人：ExxonMobil Chemical Patents Inc.

  公开号：EP1661900A1

  公开（公告）日：2006-05-31

  Fluorinated amine compounds, R'iArF-ER2, where ArF is a fluo-roaryl substituent, E is nitrogen or phosphorous, each R is independently a C1-C20 hydrocarbyl substituent, or the two R's may be connected to form an unsubstituted or substituted C2-C20 cycloaliphatic substituent, R' is a C1-C20 hydrocarbyl or halogenated hydrocarbyl, and i is 0, 1 or 2 are disclosed. These compounds may be protonated and complexed with suitable substantially noncoordinating anions to prepare polymerization catalyst components. When these catalyst components are combined with organometallic catalyst precursors, the catalyst precursor is activated to a catalyst. This catalyst is combined with monomer under olefin polymerization conditions to prepare polymer. High number-average molecular weight polymers at high productivity rates were observed from using metallocene catalysts activated with [N-pentafluorophenyl pyrrolidinium] [tetrakis(pentafluorophenyl) borate].

  本发明公开了氟化胺化合物 R'iArF-ER2，其中 ArF 为氟芳基取代基，E 为氮或磷，每个 R 独立为 C1-C20 碳氢基取代基，或两个 R 连接形成未取代或取代的 C2-C20 环脂族取代基，R'为 C1-C20 碳氢基或卤代碳氢基，i 为 0、1 或 2。这些化合物可以质子化并与适当的基本不配位阴离子络合，制备聚合催化剂组分。当这些催化剂组分与有机金属催化剂前体结合时，催化剂前体被活化成催化剂。催化剂在烯烃聚合条件下与单体结合，制备聚合物。使用[N-五氟苯基吡咯烷][四(五氟苯基)硼酸酯]活化的茂金属催化剂可以观察到高生产率下的高平均分子量聚合物。
• OLEFIN POLYMERIZATION COCATALYSTS DERIVED FROM GROUP-15 CATIONIC COMPOUNDS AND PROCESSES USING THEM
  申请人：ExxonMobil Chemical Patents Inc.

  公开号：EP1252166B1

  公开（公告）日：2005-11-09
• [EN] PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AUX RADIATIONS ET FILM DE RÉSERVE
  申请人：FUJIFILM CORP

  公开号：WO2011083872A1

  公开（公告）日：2011-07-14

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.
• Magnesium-mediated arylation of amines <i>via</i> C–F bond activation of fluoroarenes
  作者：Leonie J. Bole、Laia Davin、Alan R. Kennedy、Ross McLellan、Eva Hevia

  DOI：10.1039/c9cc01670h

  日期：——

  Exploiting the high nucleophilic power of structurally defined β-diketiminate stabilised magnesium amides, a new method for amine arylation via rapid C–F bond activation of fluoroarenes is introduced.

  利用结构明确定的β-二酮亚胺稳定的镁胺的高亲核能力，引入了一种通过快速活化氟芳烃的C-F键实现胺芳基化的新方法。