Compounds of Formula la, lb, or Ic, are described, where the various substituents are defined herein. The compounds can modulate a property or effect of Akt3 in vitro or in vivo, and can also be used, individually or in combination with other agents, in the prevention or treatment of a variety of conditions. Methods for synthesizing the compounds are described. Pharmaceutical compositions and methods of using these compounds or compositions, individually or in combination with other agents or compositions, in the prevention or treatment of a variety of conditions are also described.
Fast dye salts provide fast access to azidoarene synthons in multi-step one-pot tandem click transformations
作者:James T. Fletcher、Jacqueline E. Reilly
DOI:10.1016/j.tetlet.2011.08.069
日期:2011.10
commercially available diazonium salts could be used as efficient aromatic azide precursors in one-pot multi-step click transformations. Seven different diazonium salts, including FastRed RC, Fast Blue B, Fast Corinth V and Variamine Blue B were surveyed under aqueous click reaction conditions of CuSO4/Na ascorbate catalyst with 1:1 t-BuOH/H2O solvent. Two-step tandem reactions with terminal alkyne
该研究检查了市售的重氮盐是否可以用作一锅多步点击转化中的有效芳香叠氮化物前体。在CuSO 4 /Na 抗坏血酸盐催化剂与1:1 t- BuOH/H 2 O 溶剂的点击反应条件下,对七种不同的重氮盐,包括固红RC、固蓝B、固克林斯V 和Variamine Blue B 进行了研究。与末端炔烃和二炔共反应物的两步串联反应产生了 1,2,3-三唑产物,产率为 66-88%,而与三甲基甲硅烷基保护的炔烃和二炔共反应物的三步串联反应产生了 1, 2,3-三唑产品的产率为 61-78%。
PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME
申请人:Kansai Research Institute (KRI)
公开号:EP0962825A1
公开(公告)日:1999-12-08
A photosensitive resin composition comprises a base resin (e.g., novolak resins, polyvinylphenol-series polymers), a first photoactive ingredient (e.g., diazobenzoquinone derivatives, diazonaphthoquinone derivatives) and a second photoactive ingredient (e.g., mixtures with azide compounds) each having an absorption range at wavelength λ1 or λ2, the wavelengths thereof being different from each other. Between the first and second photoactive ingredients, at least one photoactive ingredient is substantially inert at the absorption wavelength of the other. After exposing the photosensitive resin composition to a light to form a pattern, the whole surface of the photosensitive layer is exposed to a light of the other wavelength to make the surface hardly soluble (in the case a positive pattern is formed) or readily soluble (in the case a negative pattern is formed) in a developer, and developed, thereby forming a pattern of high resolution. Utilizing an existing exposure system, there can be obtained photosensitive resin compositions (especially, resists for semiconductor production) having improved sensitivity and resolution.