2,6-bis(methoxymethyl)-4-methylphenol | 32449-09-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,6-bis(methoxymethyl)-4-methylphenol
• 英文别名: 2,6-Bis-(methoxymethyl)-p-kresol；2-Hydroxy-5-methyl-1.3-bis-methoxymethyl-benzol
• CAS: 32449-09-5
• 化学式: C₁₁H₁₆O₃
• 分子量: 196.246
• InChiKey: VRMKFAFIVOVETG-UHFFFAOYSA-N

物化性质

• 沸点：
  104 °C(Press: 0.6 Torr)
• 密度：
  1.075±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  38.7
• 氢给体数：
  1
• 氢受体数：
  3

安全信息

• 海关编码：
  2909500000

反应信息

• 作为反应物：
  描述：

  2,6-bis(methoxymethyl)-4-methylphenol 在 碘苯二乙酸 、 戴斯-马丁氧化剂 作用下， 以 二氯甲烷 为溶剂， 反应 3.5h， 生成 (3,5-bismethoxymethyl-1-methyl-4-oxocyclohexa-2,5-dienyloxy)acetaldehyde
  参考文献：
  名称：

  利用环己二烯酮的不对称去对称分子内 Stetter 反应对映选择性合成氢苯并呋喃酮。

  摘要：

  通过苯酚的脱芳构化和戴斯-马丁氧化合成了一系列环己二酮。这些底物的不对称分子内Stetter反应以良好至优异的产率和优异的立体选择性提供氢苯并呋喃酮。多取代底物可形成多达三个立体中心以及四元立体中心。放大实验证明了这种转变的实用性。

  DOI：

  10.1021/op600278f
• 作为产物：
  描述：

  2,6-bis(acetoxymethyl)-4-methylphenol 在 甲醇 、 氢氧化钾 作用下， 生成 2,6-bis(methoxymethyl)-4-methylphenol
  参考文献：
  名称：

  Barthel, Chemische Berichte, 1943, vol. 76, p. 573

  摘要：

  DOI：

文献信息

• Asymmetric Synthesis of Hydrobenzofuranones via Desymmetrization of Cyclohexadienones Using the Intramolecular Stetter Reaction
  作者：Qin Liu、Tomislav Rovis

  DOI：10.1021/ja058337u

  日期：2006.3.1

  Dearomatization of phenols followed by oxidation affords cyclohexadienyloxyacetaldehydes, which produce hydrobenzofuranones via asymmetric intramolecular Stetter reaction in good to excellent yield. Quaternary as well as up to three contiguous stereocenters may be formed in good to excellent enantioselectivities and high diastereoselectivities.

  酚类脱芳构化后氧化得到环己二烯氧基乙醛，其通过不对称分子内 Stetter 反应以良好至极好的收率生产氢苯并呋喃酮。可以形成具有良好至极好对映选择性和高非对映选择性的四元以及最多三个连续立体中心。
• Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10017664B2

  公开（公告）日：2018-07-10

  Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent. Forming resist pattern used for semiconductor production, including forming resist underlayer film by applying the resist underlayer film-forming composition onto semiconductor substrate and baking it.

  用于形成具有高干法蚀刻抗性、抗扭曲性并具有良好的平整性和嵌入性能的抗蚀底层膜形成组合物，包括通过使含有芳香环的有机化合物A和至少具有两个含酚羟基的芳香烃环团的醛B反应而获得的树脂，并具有芳香烃环团通过三级碳原子键合的结构。醛B可以是化合物的化学式（1）： 所得的树脂可能具有化学式（2）的单元结构： Ar1和Ar2各自是C6-40芳基团。含有芳香环的有机化合物A可能是芳香胺或含酚羟基的化合物。该组合物可能进一步含有溶剂、酸和/或酸发生剂，或交联剂。用于半导体生产的形成抗蚀图案，包括通过将抗蚀底层膜形成组合物涂覆在半导体衬底上并对其进行烘烤来形成抗蚀底层膜。
• Substituent-dependent disassembly of self-immolative dendrimers
  作者：Rotem Perry、Roey J. Amir、Doron Shabat

  DOI：10.1039/b615762a

  日期：——

  Self-immolative dendrimers are tree-like platforms, which can spontaneously release all their end-group molecules through a single activation event at the dendrimer’s focal point. This triggering event induces domino-like fragmentations, which leads to complete disassembly of the dendrimer into its separate building blocks. In this report, we demonstrate a simple approach to control the disassembly-rate

  自焚性树状聚合物是树状平台，可以通过在树状聚合物焦点处的单个激活事件自发释放其所有端基分子。该触发事件诱导了多米诺样的断裂，从而导致树枝状聚合物完全分解成其独立的结构单元。在这份报告中，我们演示了一种控制自消灭树枝状大分子的分解速率的简单方法。合成了两种类型的树突。与一个甲基 上的取代基 苯砌块，另一个与乙基羧基酯。具有吸电子取代基的树突（第一和第二代）的分解速度比具有吸电子取代基的树突的分解速度快约30倍。甲基 取代基。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。
• 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 감활성광선성 또는 감방사선성막을 구비한 마스크 블랭크, 패턴 형성 방법, 전자 디바이스의 제조 방법, 및 전자 디바이스
  申请人：FUJIFILM CORPORATION 후지필름 가부시키가이샤(520060414739)

  公开号：KR20160101165A

  公开（公告）日：2016-08-24

  감활성광선성 또는 감방사선성 수지 조성물은, 일반식 (4)로 나타나는 반복 단위를 포함하는 수지 (A), 및 극성기를 포함하는 가교제 (C)를 함유하고, 상기 가교제 (C)가, 일반식 (1)로 나타나는 화합물, 또는 2~5개의 일반식 (1)로 나타나는 구조가, 일반식 (3) 중의 L에 의하여 나타나는 연결기 또는 단결합을 통하여 연결된 화합물이다.(일반식 (1)~(4)에 있어서의 각 부호의 정의는, 특허 청구범위에 기재된 바와 같다.) [화학식 1]

  这是一段化学文本，其中描述了一种包含重复单元的树脂（A）和含有极性基团的交联剂（C）的感光光致聚合物，其中交联剂（C）是由式（1）或由通过连接基团或单键连接的化合物组成的2至5个式（1）所表示的结构，其中每个符号在通常情况下的定义在专利权要求书中给出。