A positive resist composition comprising a polymer having a tetrahydrobenzocycloheptane-substituted secondary or tertiary carboxyl group ester as an acid labile group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.
一种正性光刻胶组合物,包括具有四氢苯并
环庚烷取代的次级或三级
羧酸酯作为酸敏基团的聚合物,表现出高对比度的碱溶解速率,在曝光前后具有高分辨率,曝光后具有良好的图案轮廓和最小的边缘粗糙度,具有抑制酸扩散速率的显著效果,并提高了蚀刻抗性。