6,6'-dihydroxy-5,5'-dimethyl-3,3'-methanediyl-di-benzyl alcohol | 6641-13-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 6,6'-dihydroxy-5,5'-dimethyl-3,3'-methanediyl-di-benzyl alcohol
• 英文别名: 6,6'-Dihydroxy-5,5'-dimethyl-3,3'-methandiyl-di-benzylalkohol；Bis-(4-hydroxy-5-methyl-3-hydroxymethyl-phenyl)-methan；4,4'-methylene bis(2-methyl-6-hydroxymethylphenol)；4,4'-methylenebis(2-hydroxymethyl-6-methylphenol)；4-(4-Hydroxy-3-(hydroxymethyl)-5-methylbenzyl)-2-(hydroxymethyl)-6-methylphenol；4-[[4-hydroxy-3-(hydroxymethyl)-5-methylphenyl]methyl]-2-(hydroxymethyl)-6-methylphenol
• CAS: 6641-13-0
• 化学式: C₁₇H₂₀O₄
• 分子量: 288.343
• InChiKey: DOMBBFBDIIXIKP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  21
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  80.9
• 氢给体数：
  4
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  6,6'-dihydroxy-5,5'-dimethyl-3,3'-methanediyl-di-benzyl alcohol 在 乌洛托品 、 三氟乙酸 、 水 作用下， 反应 7.0h， 以69.3%的产率得到5-[(3-甲酰基-4-羟基-5-甲基苯基)甲基]-2-羟基-3-甲基苯甲醛
  参考文献：
  名称：

  METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL)

  摘要：

  在工业环境中，通过在酸的存在下使多核聚氢甲基酚或多核聚烷氧甲基酚与六亚甲基四胺反应，然后水解所得的反应产物，轻松高纯度地制备目标物质或由通式（2）表示的多核聚甲酰苯酚。

  公开号：

  US20090182175A1
• 作为产物：
  描述：

  邻甲酚 在 sodium hydroxide 作用下， 生成 6,6'-dihydroxy-5,5'-dimethyl-3,3'-methanediyl-di-benzyl alcohol
  参考文献：
  名称：

  Hanus, Journal fur praktische Chemie (Leipzig 1954), 1940, vol. <2> 155, p. 317,327, 328

  摘要：

  DOI：

文献信息

• Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10017664B2

  公开（公告）日：2018-07-10

  Resist underlayer film-forming composition for forming resist underlayer film with high dry etching resistance, wiggling resistance and exerts good flattening property and embedding property for uneven parts, including resin obtained by reacting organic compound A including aromatic ring and aldehyde B having at least two aromatic hydrocarbon ring groups having phenolic hydroxy group and having structure wherein the aromatic hydrocarbon ring groups are bonded through tertiary carbon atom. The aldehyde B may be compound of Formula (1): The obtained resin may have a unit structure of Formula (2): Ar1 and Ar2 each are C6-40 aryl group. The organic compound A including aromatic ring may be aromatic amine or phenolic hydroxy group-containing compound. The composition may contain further solvent, acid and/or acid generator, or crosslinking agent. Forming resist pattern used for semiconductor production, including forming resist underlayer film by applying the resist underlayer film-forming composition onto semiconductor substrate and baking it.

  用于形成具有高干法蚀刻抗性、抗扭曲性并具有良好的平整性和嵌入性能的抗蚀底层膜形成组合物，包括通过使含有芳香环的有机化合物A和至少具有两个含酚羟基的芳香烃环团的醛B反应而获得的树脂，并具有芳香烃环团通过三级碳原子键合的结构。醛B可以是化合物的化学式（1）： 所得的树脂可能具有化学式（2）的单元结构： Ar1和Ar2各自是C6-40芳基团。含有芳香环的有机化合物A可能是芳香胺或含酚羟基的化合物。该组合物可能进一步含有溶剂、酸和/或酸发生剂，或交联剂。用于半导体生产的形成抗蚀图案，包括通过将抗蚀底层膜形成组合物涂覆在半导体衬底上并对其进行烘烤来形成抗蚀底层膜。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Cured film-forming composition
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US10669376B2

  公开（公告）日：2020-06-02

  Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R1 denotes hydrogen or a methyl group, and R2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R2.)

  提供的是一种治愈的成膜组合物，由该组合物形成的图像形成底层膜表现出高液体排斥性（亲疏性），即使暴露于低量紫外辐射下，底层膜的亲疏性和液体排斥性也可以轻松改变；以及使用该组合物获得的治愈膜。该治愈成膜树脂组合物的特点是包含：作为组分（A）的具有来自第一单体的结构单元的聚合物，该单体的结构式为（1）；除组分（A）外的另一种聚合物，其相对于聚合物总重量的含氟量低于组分（A），作为组分（B）；作为组分（C）的光酸发生剂；和溶剂。（在公式中，R1表示氢或甲基基团，R2表示能够与R2键合的氧原子一起脱落的含氟基团。）
• SILOXANE-BASED RESIN COMPOSITION
  申请人：Suwa Mitsuhito

  公开号：US20100316953A1

  公开（公告）日：2010-12-16

  The present invention is a siloxane-based resin composition including a siloxane-based resin and an imidosilane compound having a specific structure. Moreover, the present invention is a siloxane-based resin composition including a siloxane-based resin which is a reactive product to be obtained by hydrolyzing an alkoxysilane compound and an imidosilane compound having a specific structure and then making the resulting hydrolysate undergo a condensation reaction. According to the present invention, it is possible to form a cured film excellent in adhesion.

  本发明是一种基于硅氧烷的树脂组合物，包括一种基于硅氧烷的树脂和一种具有特定结构的亚氨基硅烷化合物。此外，本发明还是一种基于硅氧烷的树脂组合物，包括一种基于硅氧烷的树脂，该树脂是通过水解烷氧基硅烷化合物和具有特定结构的亚氨基硅烷化合物反应产生的反应产物，然后使所得到的水解产物经历缩合反应而得到的。根据本发明，可以形成具有优异附着力的固化膜。
• Method for producing new polynuclear poly(formylphenol)
  申请人：Honshu Chemical Industry Co., Ltd.

  公开号：US07750190B2

  公开（公告）日：2010-07-06

  Produce the target substance, or a polynuclear poly(formylphenol) expressed by General Formula (2), in an industrial setting with ease and at high purity by causing a polynuclear poly(hydroxymethylphenol) or polynuclear poly(alkoxymethylphenol) to react with hexamethylene tetramine in the presence of an acid and then hydrolyzing the obtained reaction product.

  在工业环境中，通过在酸的存在下使多核聚合物（羟甲基苯酚）或多核聚合物（烷氧甲基苯酚）与六亚甲基四胺反应，然后水解所得的反应产物，轻松高纯度地生产目标物质或由通式（2）表示的多核聚合物（甲醛苯酚）。