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2,4-双(羟甲基)-6-甲基苯酚 | 7451-94-7

中文名称
2,4-双(羟甲基)-6-甲基苯酚
中文别名
——
英文名称
4,6-bis(hydroxymethyl)-2-methylphenol
英文别名
4-Hydroxy-5-methyl-1.3-bis-hydroxymethyl-benzol;2,4-Bis-hydroxymethyl-6-methyl-phenol;4,6-Bis-hydroxymethyl-2-methyl-phenol;2,4-Bis-(hydroxy-methyl)-o-kresol;2,4-Bis(hydroxymethyl)-6-methylphenol
2,4-双(羟甲基)-6-甲基苯酚化学式
CAS
7451-94-7
化学式
C9H12O3
mdl
——
分子量
168.192
InChiKey
NSBGRQGYTRBWNG-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.7
  • 重原子数:
    12
  • 可旋转键数:
    2
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.33
  • 拓扑面积:
    60.7
  • 氢给体数:
    3
  • 氢受体数:
    3

SDS

SDS:2978a71d542eb8494fc823152b94d80c
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上下游信息

  • 下游产品
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

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文献信息

  • Optically active compound and photosensitive resin composition
    申请人:——
    公开号:US20030211421A1
    公开(公告)日:2003-11-13
    A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
    一种光活性化合物与光敏剂结合使用,由以下公式(1)表示: A −[( J ) m −( X-Pro )] n (1) 其中,A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元,J代表连接基团,X-Pro代表由光照可去除的保护基团Pro保护的亲水基团,m代表0或1,n代表不少于1的整数。 保护基团Pro可以与光敏剂(特别是光酸发生剂)一起通过光照可去除,也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性,用于光刻应用,因此,该光活性化合物有利于形成具有高分辨率的图案。
  • MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF
    申请人:Yang Guoqiang
    公开号:US20150037735A1
    公开(公告)日:2015-02-05
    The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.
    本发明提供了一类分子玻璃光刻胶(I和II),其主要结构包括双酚A,并提供了它们的制备方法。该分子玻璃光刻胶由光酸发生剂、交联剂、光刻胶溶剂和其他添加剂配制而成,可制备成正向或负向光刻胶。通过旋涂在硅片上形成均匀厚度的光刻胶。该光刻胶配方可用于现代光刻技术,如248纳米光刻、193纳米光刻、极紫外(EUV)光刻、纳米压印光刻、电子束光刻,特别是EUV光刻技术中。
  • Pulsed 2-Dimensional Raman Spectroscopy on Microdroplets
    作者:H. Moritz、G. Schweiger
    DOI:10.1002/(sici)1521-4125(200004)23:4<361::aid-ceat361>3.0.co;2-g
    日期:2000.4
    Raman spectroscopy to determine the average concentration in the liquid phase and concentration distribution in the gas phase surrounding desorbing linear arrays of binary microdroplets. For this study, monodisperse microdroplets consisting of acetylene dissolved in acetone were generated by a modified vibrating orifice aerosol generator (VOAG). The 2-dimensional concentration fields of acetylene desorbed
    在这项研究中,我们使用基于脉冲拉曼光谱的技术来确定液相中的平均浓度和气相中围绕解吸线性二元微滴阵列的浓度分布。在这项研究中,由溶解在丙酮中的乙炔组成的单分散微滴是通过改进的振动孔气溶胶发生器 (VOAG) 产生的。从液滴中解吸的乙炔二维浓度场的空间分辨率约为 40 μm,沿液滴链方向和垂直于液滴链的方向。气相和液相浓度的检测限分别约为 100 ppm 和 1 mmol/l。
  • TRANSPARENT FLUORINE-CONTAINING POLYMER
    申请人:Kubota Toshio
    公开号:US20120148808A1
    公开(公告)日:2012-06-14
    Disclosed is a fluorine-containing polymer obtained by polymerizing a 1,6-diene-type ether compound represented by formula [1] and, for example, a (meth)acrylic acid compound represented by formula [2]. The fluorine-containing polymer shows high transparency, has a high glass transition point, and is soluble in a solvent and therefore has moldability. In the case where a (meth)acrylic unit has a reactive substituent, by utilizing the crosslinking reaction thereof, a thin film having high solvent resistance can be produced. In formulae [1] and [21, R 1 and R 2 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, which may be substituted, R 3 represents a hydrogen atom, a fluorine atom, or a methyl group, and R 4 represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, which may be substituted, or an aromatic group having 5 to 10 ring members, which may be substituted.
    本发明公开了一种含氟聚合物,其通过聚合由式[1]表示的1,6-二烯型醚化合物和例如由式[2]表示的(甲基)丙烯酸化合物等制得。该含氟聚合物具有高透明度,具有较高的玻璃转移温度,可溶于溶剂,因此具有成型性。在(甲基)丙烯酸单元具有反应性取代基的情况下,通过利用其交联反应,可以制备具有高溶剂耐受性的薄膜。在式[1]和[2]中,R1和R2分别独立表示氢原子或具有1至12个碳原子的烷基基团,可以被取代,R3表示氢原子、氟原子或甲基基团,R4表示氢原子、具有1至12个碳原子的烷基基团,可以被取代,或具有5至10个环成员的芳香族基团,可以被取代。
  • TRIAZINE RING-CONTAINING POLYMER AND COMPOSITION FOR FILM FORMATION COMPRISING SAME
    申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
    公开号:US20140371367A1
    公开(公告)日:2014-12-18
    Provided is a triazine ring-containing hyperbranched polymer comprising the repeating unit structure represented by formula (1) and having one or more triazine ring terminals, said one or more triazine ring terminals being capped with a compound that differs from the diamine compound serving as the starting material for the polymer and has at least two active hydrogen groups. In addition to the polymer itself exhibiting high heat resistance, high transparency, a high refractive index, high light resistance, high solubility, and low volume shrinkage, it is also possible to use the polymer to provide a composition for film formation capable of yielding a thick film having high hardness. (In formula (1), R and R′ each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aralkyl group, and Ar represents a divalent organic group containing an aromatic ring and/or a heterocyclic ring.)
    提供的是一种含有三嗪环的超支化聚合物,其重复单元结构由式(1)表示,并具有一个或多个三嗪环端基,其中,所述一个或多个三嗪环端基被与作为聚合物起始材料的二胺化合物不同的化合物封顶,该化合物具有至少两个活性氢基团。除了聚合物本身具有高耐热性、高透明度、高折射率、高耐光性、高溶解性和低体积收缩率之外,还可以使用该聚合物提供用于制备薄膜的组合物,该组合物能够产生具有高硬度的厚膜。(在式(1)中,R和R'各自独立地表示氢原子、烷基、烷氧基、芳基或芳烷基,Ar表示一个含有芳香环和/或杂环的二价有机基团。)
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