5-norbornene-2-carboxylic acid glycidyl ester | 2495-47-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 5-norbornene-2-carboxylic acid glycidyl ester
• 英文别名: glycidyl bicyclo[2.2.1]hept-5-ene-2-carboxylate；Oxiran-2-ylmethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate；oxiran-2-ylmethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 2495-47-8
• 化学式: C₁₁H₁₄O₃
• 分子量: 194.23
• InChiKey: YBCIDCSDCILTTE-UHFFFAOYSA-N

物化性质

• 沸点：
  288.4±28.0 °C(Predicted)
• 密度：
  1.241±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  38.8
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  5-norbornene-2-carboxylic acid glycidyl ester 、 1H,1H,2H,2H-perfluorohexyl mercaptan 反应 0.5h， 以99%的产率得到
  参考文献：
  名称：

  含氟阳离子聚合单体及其合成和应用

  摘要：

  本发明涉及式(I)单体化合物，其中各变量如说明书中所定义。该单体通过硫醇与烯烃之间的点击化学反应以高产率、快速合成，而且将基本上全氟化的烷烃链借助于包含降冰片烷结构部分的连接基引入到氧杂环烷烃类单体中，使得由所得单体阳离子光固化得到的光固化薄膜表面硬度高，表面能低，疏水疏油性能优良，尤其是抗油性沾污非常好。本发明还涉及所述单体的制备方法，该单体开环聚合得到的聚合物，包含该单体的可光固化组合物和由该可光固化组合物光固化得到的光固化材料。

  公开号：

  CN111057028B
• 作为产物：
  描述：

  缩水甘油 、 5-降冰片烯-2-羧酸 在 草酰氯 、 碳酸氢钠 作用下， 以 二氯甲烷 为溶剂， 反应 19.0h， 以81%的产率得到5-norbornene-2-carboxylic acid glycidyl ester
  参考文献：
  名称：

  含氟阳离子聚合单体及其合成和应用

  摘要：

  本发明涉及式(I)单体化合物，其中各变量如说明书中所定义。该单体通过硫醇与烯烃之间的点击化学反应以高产率、快速合成，而且将基本上全氟化的烷烃链借助于包含降冰片烷结构部分的连接基引入到氧杂环烷烃类单体中，使得由所得单体阳离子光固化得到的光固化薄膜表面硬度高，表面能低，疏水疏油性能优良，尤其是抗油性沾污非常好。本发明还涉及所述单体的制备方法，该单体开环聚合得到的聚合物，包含该单体的可光固化组合物和由该可光固化组合物光固化得到的光固化材料。

  公开号：

  CN111057028B

文献信息

• Display Panel Including Patterned Spacer
  申请人：Kim Sung Hyun

  公开号：US20080213514A1

  公开（公告）日：2008-09-04

  Disclosed is a display panel including a lower substrate, upper substrate, and a patterned spacer that causes the lower substrate and upper substrate to be spaced apart from each other by a predetermined distance, wherein the patterned spacer is obtained from a photo-sensitive resin composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photo polymerizable reactive resin binder; and (c) a polymerizable compound: (wherein each of R1-R5 has the same meaning as defined herein). A photosensitive resin composition for use in a patterned spacer is also disclosed, the composition comprising: (a) a triazine-based photopolymerization initiator represented by the following formula 1; (b) an alkali-soluble photopolymerizable reactive resin binder; (c) a polymerizable compound; and (d) a solvent. The photosensitive resin composition shows high sensitivity and excellent properties related with development, and provides a patterned spacer having excellent strength, sensitivity, residue characteristics, film uniformity, residual film ratio, etc.

  本发明公开了一种显示面板，包括下部基板、上部基板和图案间隔器，该图案间隔器使得下部基板和上部基板相互间隔一个预定距离，其中，所述图案间隔器是由以下组分组成的光敏树脂组合物制得：(a)一种由以下公式1表示的三嗪基光聚合引发剂；(b)一种碱溶性光聚合反应树脂粘合剂；以及(c)一种聚合物化合物：(其中，R1-R5中的每一个具有如下所定义的相同含义)。本发明还公开了一种用于图案间隔器的光敏树脂组合物，该组合物包括：(a)一种由以下公式1表示的三嗪基光聚合引发剂；(b)一种碱溶性光聚合反应树脂粘合剂；(c)一种聚合物化合物；以及(d)一种溶剂。所述光敏树脂组合物具有高灵敏度和与显影相关的优异性能，并提供具有优异强度、灵敏度、残留特性、膜均匀性、残留膜比率等特性的图案间隔器。
• Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof
  申请人：Kim Dong-seok

  公开号：US20070093640A1

  公开（公告）日：2007-04-26

  The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices. In more detail, the present invention relates to a negative-type photosensitive transparent polyimide precursor resin composition manufactured in two steps. The first step is the manufacture of a transparent linear polyamic acid (A) from (a-1) one or more kinds of tetracarboxylic acid dianhydrides selected from alicyclic tetracarboxylic acid dianhydrides having 3 to 30 carbon atoms; and (a-2) one or more kinds of diamines selected from aliphatic, alicyclic, or non-conjugated aromatic diamines, having 3 to 30 carbon atoms, having one or more ethylenically unsaturated bonds at side chains as essential components; and the second step is the manufacture of reactive transparent polyimide precursors shown in the following Chemical Formula 1 according to the esterification reaction of the above polyamic acid (A) with ethylenically unsaturated compound (B) containing an epoxy group in the same molecule as the main component. The photosensitive transparent polyimide precursor resin compositions according to the present invention have a superior photosensitivity, and thus, may be used for transparent protection layers and insulation layers of liquid crystal display devices having superior heat resistance, chemical resistance, mechanical strength, and electricity insulation.
• TRANSPARENT, HIGHLY HEAT-RESISTANT POLYIMIDE PRECURSOR AND PHOTOSENSITIVE POLYIMIDE COMPOSITION THEREOF
  申请人：KIM Dong-Seok

  公开号：US20120308741A1

  公开（公告）日：2012-12-06

  The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices.
• US8232366B2
  申请人：——

  公开号：US8232366B2

  公开（公告）日：2012-07-31
• US8703901B2
  申请人：——

  公开号：US8703901B2

  公开（公告）日：2014-04-22