The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.
[EN] COMPOSITE RESIN COMPOSITION AND METHOD FOR PRODUCING COMPOSITE RESIN COMPOSITION<br/>[FR] COMPOSITION DE RÉSINE COMPOSITE ET PROCÉDÉ DE PRODUCTION DE LA COMPOSITION DE RÉSINE COMPOSITE<br/>[JA] 複合樹脂組成物及び複合樹脂組成物の製造方法
Mechanistic Distinctions between Cation Radical and Carbocation Propagated Polymerization
作者:J. Todd Aplin、Nathan L. Bauld
DOI:10.1021/jo972072n
日期:1998.4.1
The polymerization of bis[4-(1-propenyl)phenyl] ether in the presence of tris(4-bromophenyl)aminium hexachloroantimonate is found to occur by competing cation radical and carbocation pathways. These pathways involve, respectively, cyclobutanation and linear addition. Methods for favoring each mechanistic type are proposed and explored.