Provided is an actinic ray-sensitive or radiation-sensitive resin composition that is capable of obtaining a pattern having excellent LWR performance even in a case where the composition has been stored for a long period of time. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition includes an acid-decomposable resin and a specific compound, in which the specific compound has two or more cationic moieties and the same number of anionic moieties as that of the cationic moieties, and at least one of the cationic moieties has a group represented by General Formula (I).
本发明提供了一种即使在长期储存的情况下也能获得具有优异低辐射性能的图案的对放 射线敏感或对辐射敏感的
树脂组合物。此外,还提供了一种抗蚀薄膜、一种图案形成方法和一种制造电子设备的方法,每种方法都与对放 射线敏感或对辐射敏感的
树脂组合物有关。感光或辐射敏感
树脂组合物包括可酸性分解的
树脂和特定化合物,其中特定化合物具有两个或两个以上阳离子分子和与阳离子分子数目相同的阴离子分子,阳离子分子中至少有一个具有通式(I)所代表的基团。