1,3-bis-methoxymethyl-5-methyl-[1,3,5]triazinan-2-one | 104768-77-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 三嗪烷类
• 英文名称: 1,3-bis-methoxymethyl-5-methyl-[1,3,5]triazinan-2-one
• 英文别名: 1,3-bis-methoxymethyl-5-methyl-tetrahydro-[1,3,5]triazin-2-one；1,3-Bis-methoxymethyl-5-methyl-tetrahydro-[1,3,5]triazin-2-on；1,3-Bis(methoxymethyl)-5-methyl-1,3,5-triazinan-2-one
• CAS: 104768-77-6
• 化学式: C₈H₁₇N₃O₃
• 分子量: 203.241
• InChiKey: BZOOGHIBKDWBAU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.4
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  45.2
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  3,4,5,6-四氢-5-甲基-1,3,5-三嗪-2(1H)-酮 、 聚合甲醛 在 barium dihydroxide 、 水 作用下， 生成 1,3-bis-methoxymethyl-5-methyl-[1,3,5]triazinan-2-one
  参考文献：
  名称：

  Triazone ring compound

  摘要：

  公开号：

  US02321989A1

文献信息

• PATTERNABLE LOW DIELECTRIC CONSTANT MATERIALS AND THEIR USE IN ULSI INTERCONNECTION
  申请人：Lin Qinghuang

  公开号：US20080063880A1

  公开（公告）日：2008-03-13

  The present invention relates to ultra-large scale integrated (ULSI) interconnect structures, and more particularly to patternable low dielectric constant (low-k) materials suitable for use in ULSI interconnect structures. The patternable low-k dielectrics disclosed herein are functionalized polymers that having one or more acid-sensitive imageable functional groups.

  本发明涉及超大规模集成（ULSI）互连结构，更具体地涉及适用于ULSI互连结构的可图案化低介电常数（低-k）材料。本发明所披露的可图案化低-k介电材料是具有一种或多种酸敏感可成像功能基团的功能化聚合物。
• DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS
  申请人：CHEN KUANG-JUNG

  公开号：US20130040238A1

  公开（公告）日：2013-02-14

  A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC composition is insoluble in a typical resist solvent such as propylene glycol methyl ether acetate (PGMEA) after coating and baking. The NDBARC material also includes a photoacid generator, and optionally a crosslinking compound. In the NDBARC material, the carboxylic acid provides the developer solubility, while the alcohol alone, the carboxylic acid alone, or their combination provides the PGMEA resistance. The NDBARC material has resistance to the resist solvent, and thus, intermixing does not occur between NDBARC and resist during resist coating over NDBARC. After exposure and bake, the lithographically exposed portions of both the negative photoresist and the NDBARC layer become insoluble in developer due to the chemically amplified crosslinking of the polymers in negative resist and NDBARC layer in the lithographically exposed portions.

  一种负可展性底部防反射涂层（NDBARC）材料，包括含有脂肪族醇基团、芳香基团和羧酸基团的聚合物。NDBARC组合物在涂覆和烘烤后，不溶于典型的抗蚀剂溶剂，如丙二醇甲醚乙酸酯（PGMEA）。NDBARC材料还包括光酸发生剂，以及可选的交联化合物。在NDBARC材料中，羧酸提供了开发剂的溶解性，而仅有醇，仅有羧酸或它们的组合提供了对PGMEA的抗性。NDBARC材料具有抗抗蚀剂溶剂的性能，因此，在涂覆NDBARC时，NDBARC和抗蚀剂之间不会发生混合。经过曝光和烘烤后，负光刻胶和NDBARC层的光刻曝光部分由于聚合物的化学增强交联而变得不溶于开发剂。
• New organic bottom antireflective polymer compositions
  申请人：Yao Huirong

  公开号：US20070020557A1

  公开（公告）日：2007-01-25

  The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating.
• Antireflective Coating Composition
  申请人：Xiang Zhong

  公开号：US20090042133A1

  公开（公告）日：2009-02-12

  An antireflective coating composition which forms films with high n values is described.
• Antireflective Coating Compositions
  申请人：Yao Huirong

  公开号：US20100009297A1

  公开（公告）日：2010-01-14

  Antireflective coatings and related polymers are disclosed.