SULFAMIDE AND SULFAMATE DERIVATIVES AS HISTONE DEACETYLASE INHIBITORS
申请人:Smil David
公开号:US20070293530A1
公开(公告)日:2007-12-20
This invention relates to compounds for the inhibition of histone deacetylase. More particularly, the invention provides for compounds of formula (I), and racemic and scalemic mixtures, diastereomers and enantiomers thereof:
or an N-oxide, hydrate, solvate, pharmaceutically acceptable salt, prodrug or complex thereof, wherein Y, L, Z, W, M, R
a
, R
b
and R
c
are as defined in the specification.
这项发明涉及用于抑制组蛋白去乙酰化酶的化合物。更具体地,该发明提供了符合式(I)的化合物,以及它们的外消旋和内消旋混合物、非对映体和对映体:
或其N-氧化物、水合物、溶剂合物、药学上可接受的盐、前药或其复合物,其中Y、L、Z、W、M、R
a
、R
b
和R
c
如规范中所定义。
Concerning the Boron-Mediated Aldol Reaction of Carboxylic Esters
作者:Atsushi Abiko、Ji-Feng Liu、Satoru Masamune
DOI:10.1021/jo960252b
日期:1996.1.1
PHOTORESIST COMPOSITION
申请人:MASUYAMA Tatsuro
公开号:US20110065047A1
公开(公告)日:2011-03-17
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I):
wherein R
1
, R
2
and R
3
each independently represent a hydrogen atom or a C1-C4 alkyl group,
A
1
represents a single bond or a C1-C2 alkylene group,
R
4
and R
5
each independently represent a hydrogen atom or a C1-C2 alkyl group,
R
6
and R
7
each independently represent a hydrogen atom etc.
US8530137B2
申请人:——
公开号:US8530137B2
公开(公告)日:2013-09-10
Boron-Mediated Aldol Reaction of Carboxylic Esters: Complementary Anti- and Syn-Selective Asymmetric Aldol Reactions
作者:Tadashi Inoue、Ji-Feng Liu、Dana C. Buske、Atsushi Abiko
DOI:10.1021/jo0257896
日期:2002.7.1
The boron-mediated aldol reaction of carboxylic esters is described in detail. Contrary to the general belief that carboxylic esters are inert under the condition of the boron enolate formation, propionate esters are enolized with certain combinations of a boron triflate and an amine. More importantly, the stereochemical course of the aldol reaction can be controlled by the judicious selection of the