2-Hydroxyadamantane-1-carboxylic acid | 40556-88-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羟基酸及其衍生物
• 英文名称: 2-Hydroxyadamantane-1-carboxylic acid
• CAS: 40556-88-5
• 化学式: C₁₁H₁₆O₃
• 分子量: 196.24
• InChiKey: QBEMWLMHTDRJGK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  2-Hydroxyadamantane-1-carboxylic acid 、 金刚烷杂质18 生成 3-羟基金刚烷-1-羧酸
  参考文献：
  名称：

  8-tricycloalkyl xanthine derivatives

  摘要：

  提供了一种新的黄嘌呤化合物(I) ##STR1## 其中R.sup.1和R.sup.2相同或不同，分别代表羟基取代的、氧代取代的或未取代的低碳基，Y是单键或烷基，Q是 ##STR2## 其中R.sup.3和R.sup.4相同或不同，分别代表氢或羟基，n为0或1; 前提是当R.sup.3和R.sup.4都为氢时，R.sup.1和R.sup.2中至少有一个为羟基取代或氧代取代的低碳基; 或其药学上可接受的盐。该黄嘌呤化合物具有腺苷A.sub.1受体拮抗活性，因此具有利尿作用、肾保护作用、支气管扩张作用、改善脑功能作用和抗痴呆作用。

  公开号：

  US05395836A1
• 作为产物：
  描述：

  2-oxoadamantane-1-carboxylic acid 、 硼氢化钠 以90%的产率得到
  参考文献：
  名称：

  MANCHAND, PERCY S.;CERRUTI, RICHARD L.;MARTIN, JOSEPH A.;HILL, CHRISTOPHE+, J. MED. CHEM., 33,(1990) N, C. 1992-1995

  摘要：

  DOI：

文献信息

• [EN] ADAMANTANYL-SUBSTITUTED BENZAMIDE COMPOUNDS AND THEIR USE AS P2X7 RECEPTOR ANTAGONISTS<br/>[FR] COMPOSÉS BENZAMIDE SUBSTITUÉS PAR ADAMANTANYLE ET LEUR UTILISATION EN TANT QU'ANTAGONISTES DU RÉCEPTEUR P2X7
  申请人：UNIV SYDNEY

  公开号：WO2020037350A1

  公开（公告）日：2020-02-27

  The present invention relates to adamantanyl-substituted benzamide compounds and their use as antagonists of the P2X7 purinoreceptor. The invention further relates to methods for the treatment of disease and conditions associated with the P2X7 purinoreceptor.

  本发明涉及金刚烷基取代苯甲酰胺化合物及其作为P2X7嘌呤受体拮抗剂的用途。该发明还涉及与P2X7嘌呤受体相关的疾病和病况的治疗方法。
• PHOTO-DESTROYABLE QUENCHER AND ASSOCIATED PHOTORESIST COMPOSITION, AND DEVICE-FORMING METHOD
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20150346599A1

  公开（公告）日：2015-12-03

  A photo-destroyable quencher has the structure wherein X, n, and R 1 -R 6 are defined herein, and at least one of R 2 , R 3 , R 4 , R 5 , and R 6 is halogen, nitro, C 1-12 fluorinated alkyl, cyano, aldehyde, C 2-20 ester, C 2-20 ketone, C 1-20 sulfoxyl hydrocarbyl, C 1-20 sulfonyl hydrocarbyl, or sulfonamide. The photo-destroyable quencher exhibits improved solution stability and reduced hygroscopic properties relative to triphenylsulfonium phenolate. A photoresist composition including an acid-sensitive polymer, a photoacid generator, and the photo-destroyable quencher exhibits increased contrast and/or critical dimension uniformity relative to corresponding photoresist compositions comparative photo-destroyable quenchers.

  一种可被光破坏的猝灭剂具有以下结构，其中X、n和R1-R6如本文所定义，且R2、R3、R4、R5和R6中至少有一个是卤素、硝基、C1-12氟化烷基、氰基、醛基、C2-20酯、C2-20酮、C1-20烷基磺氧基、C1-20烷基磺酰基或磺胺基。该可被光破坏的猝灭剂相对于三苯基砜酚酚酚酚具有改善的溶液稳定性和减少的亲湿性能。包括酸敏感聚合物、光酸发生剂和可被光破坏的猝灭剂的光刻胶组合物相对于相应的光刻胶组合物比较照片破坏性猝灭剂具有增加的对比度和/或临界尺寸均匀性。
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT
  申请人：MATSUDA Yasuhiko

  公开号：US20130065186A1

  公开（公告）日：2013-03-14

  A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R 2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R 1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO 3 or SO 2 . R 2 represents a cyclic hydrocarbon group. R 3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. Z—R 1 —X—R 2 —(R 3 ) n (I) —R 31 -G-R 13 (x)

  一种辐射敏感树脂组合物包括酸发生剂，通过放射性射线照射生成有机酸。该有机酸具有环烃基和有机基，包括可被酸或碱裂解以产生极性基团的键。有机酸最好由以下式（I）表示。其中，Z代表有机酸基团。R2代表脂肪二元基，其中R1代表脂肪二元基中的一部分或全部氢原子可选地被氟原子取代。X代表单键，O，OCO，COO，CO，SO3或SO2。R2代表环烃基。R3代表具有以下式（x）所表示的官能团的一价有机基。n为1到3的整数。Z-R1-X-R2-(R3)n（I）-R31-G-R13（x）。
• Photoresist composition
  申请人：Kamabuchi Akira

  公开号：US10377692B2

  公开（公告）日：2019-08-13

  A photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I′): wherein R51, R52, R53 and R54 independently each represent a C1-C8 alkyl group, and A11 represents a C3-C36 divalent saturated cyclic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents or a C6-C20 divalent aromatic hydrocarbon group which can contain one or more heteroatoms and which have one or more substituents.

  一种光阻组合物，包括以下成分：由含有酸敏感基团的化合物衍生的结构单元构成的树脂，该树脂在碱性水溶液中不溶或溶解性差，但在酸的作用下变得可溶于碱性水溶液；酸发生剂；以及由下式（I'）表示的化合物：其中，R51、R52、R53和R54各自独立地表示C1-C8烷基；A11表示一个C3-C36的二价饱和环烃基，该基团可以含有一个或多个杂原子，并且可以具有一个或多个取代基，或者表示一个C6-C20的二价芳香族烃基，该基团可以含有一个或多个杂原子，并且可以具有一个或多个取代基。
• ADAMANTANEMETHANOL DERIVATIVES AND PRODUCTION PROCESSES THEREOF
  申请人：——

  公开号：US20020016516A1

  公开（公告）日：2002-02-07

  An adamantanemethanol derivative of the invention is represented by the following formula (1), wherein R a is a hydrogen atom or a hydrocarbon group; R b is a hydrocarbon group having a carbon atom, to which carbon atom at least one hydrogen atom is bonded, at a bonding site with the adjacent carbon atom; R c , R d and R e are each a hydrogen atom, a hydroxyl group which may be protected by a protective group or the like; provided that a hydroxyl group protected by a protective group or the like is bonded to at least one carbon atom constituting the adamantane skeleton when R a is a hydrogen atom or a methyl group and R b is a methyl group; and at least one substituent, in addition to the HO—C(R a ) (R b )— group indicated in the formula (1), is bonded to the adamantane ring when one of R a and R b is a methyl group and the other is an ethyl group. 1

  该发明的一种金刚烷甲醇衍生物由以下公式（1）表示，其中R是氢原子或烃基；Rb是具有碳原子的烃基，在与相邻碳原子的结合位点上至少与一个氢原子键合；Rc、Rd和Re分别是氢原子、羟基或被保护基团等；前提是当R为氢原子或甲基基团，Rb为甲基基团时，至少一个被保护羟基或类似物被键合到构成金刚烷骨架的至少一个碳原子上；当Ra和Rb中有一个为甲基基团，另一个为乙基基团时，除公式（1）中指示的HO—C（Ra）（Rb）基团外，至少有一个取代基键合到金刚烷环上。