4,5,5,5-Tetrafluoro-4-(trifluoromethyl)-2-pentenoic acid | 243139-64-2

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 4,5,5,5-Tetrafluoro-4-(trifluoromethyl)-2-pentenoic acid
• 英文别名: (E)-4,5,5,5-tetrafluoro-4-(trifluoromethyl)pent-2-enoic acid
• CAS: 243139-64-2
• 化学式: C₆H₃F₇O₂
• 分子量: 240.08
• InChiKey: PRHNILJSRYVRAY-OWOJBTEDSA-N

物化性质

• 沸点：
  153.0±40.0 °C(Predicted)
• 密度：
  1.557±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  9

安全信息

• 危险品标志：
  C
• 海关编码：
  2916190090

文献信息

• PHENYLIMIDAZOLE COMPOUNDS
  申请人：Shibutani Tadao

  公开号：US20110275823A1

  公开（公告）日：2011-11-10

  [Object] To provide a pharmaceutical product (chemotherapeutic agent) effective in the prevention and treatment of hyperlipidemia, obesity, etc. [Solving Means] A phenylimidazole compound represented by the following General Formula (1): wherein, R 1 represents a hydrogen atom, a phenyl lower alkyl group optionally having a substituent, or a pyridyl lower alkyl group optionally having a substituent, and the benzene ring and the pyridine ring are optionally substituted with 1 or 2 substituents selected from the group consisting of halogen atoms, cyano group and halogen-substituted lower alkyl groups. One of R 2 and R 3 represents a hydrogen atom and the other represents a lower alkoxy group. R 4 represents a phenyl group optionally having a substituent. R 5 and R 6 are the same or different, and represent a hydrogen atom or a lower alkyl group. R 7 and R 8 are the same or different, and represent a hydrogen atom or a lower alkoxy group. However, when R 1 represents an unsubstituted phenyl lower alkyl group, R 2 represents a lower alkoxy group, R 3 represents a hydrogen atom, R 4 represents a phenyl group optionally having a substituent, and R 5 represents a hydrogen atom, R 6 is not a hydrogen atom.

  提供一种在预防和治疗高脂血症、肥胖等方面有效的药物产品（化疗药物）。 解决方法是通过以下一般式（1）所代表的苯基咪唑化合物： 其中，R1代表氢原子、苯基较低烷基基团（可选地带有取代基）或吡啶基较低烷基基团（可选地带有取代基），苯环和吡啶环可选地带有来自卤原子、氰基和卤代较低烷基基团的1或2个取代基。R2和R3中的一个代表氢原子，另一个代表较低烷氧基团。R4代表可选地带有取代基的苯基团。R5和R6相同或不同，代表氢原子或较低烷基基团。R7和R8相同或不同，代表氢原子或较低烷氧基团。但是，当R1代表未取代的苯基较低烷基基团时，R2代表较低烷氧基团，R3代表氢原子，R4代表可选地带有取代基的苯基团，R5代表氢原子时，R6不是氢原子。
• NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180044459A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.

  制备了含有α-羟基芳基酮的侧链磺酸酯的非离子光酸发生（PAG）可聚合单体。芳基酮基团在酮基团的α位有全氟取代基。磺酸酯的硫也直接连接到氟化基团。从这些PAG单体制备的PAG聚合物在暴露于高能辐射（如深紫外或极紫外光）时释放出强磺酸。在经过后曝光烘烤（PEB）处理（100°C至150°C）的暴露光刻胶层中，光生成的磺酸扩散速率较低，结果在显影后形成良好的线型图案。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：KATO Misugi

  公开号：US20120322006A1

  公开（公告）日：2012-12-20

  A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C 1 -C 3 alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M + represents a monovalent cation. This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.

  根据本发明，磺酸盐树脂具有以下通用公式（3）的重复单元：其中X分别表示氢原子或氟原子；n表示1至10的整数；R表示氢原子、卤原子或C1-C3烷基或含氟烷基团；J表示二价连接基团；M+表示一价阳离子。这种磺酸盐树脂在侧链中含有磺酸盐鉮盐，磺酸盐鉮盐的阴离子部分固定在磺酸盐树脂上，因此作为具有良好抗性特性（如DOF、LER、灵敏度和分辨率）的抗性树脂。
• Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：MORI Kazunori

  公开号：US20130065182A1

  公开（公告）日：2013-03-14

  According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

  根据本发明，提供了一种含氟磺酸盐重复单元为以下通式（3）的树脂。为了防止图案形成后的粗糙度或图案形成失败等不足，该含氟磺酸盐树脂具有光酸发生功能，并作为一种抗蚀树脂，其中“能够通过酸作用改变其显影剂溶解性的基团”和“具有光酸发生功能的基团”有规律地排列。