Continuous-wave CO2 laser-photosensitized (SF6) decomposition of 4-silaspiro[3,3]heptane is dominated by the transient formation and polymerization of 2-silaallene. The first experimental evidence for 2-silaallene has been achieved via scavenging with alcohols ROH (R CH3, CF3CH2) to afford dialkoxy(dimethyl)silanes, (RO)2Si(CH3)2. ESCA analysis of the polymer demonstrates SiC2 stoichiometry and indicates
4-silaspiro [3,3]
庚烷的连续波CO 2激光光敏(SF 6)分解主要是由2-
硅氮
丙烯的瞬时形成和聚合引起的。通过用醇ROH(RCH 3,CF 3 CH 2)清除得到二烷氧基(二甲基)
硅烷,(RO)2 Si(CH 3)2,获得了2-
硅丙二烯的第一个实验证据。聚合物的ESCA分析表明SiC 2的
化学计量,表明氧的引入,这可以通过残留的SiC键与空气反应来解释。