A substrate is described having a treated contact surface comprising a carbon or silicon compound comprising from 1 to 30 atomic percent oxygen, from 0.1 to 30 atomic percent nitrogen, or both, each as measured by XPS. The treated contact surface has a biomolecule recovery percentage greater than the biomolecule recovery percentage of the surface before treatment according to the method.
所述的基底具有经过处理的接触表面,该表面由碳或
硅化合物组成,其中氧原子含量为 1%至 30%,氮原子含量为 0.1%至 30%,或两者均有,经 XPS 测定,氧原子含量为 1%至 30%,氮原子含量为 0.1%至 30%,或两者均有。经处理的接触表面的
生物分子回收率大于按该方法处理前表面的
生物分子回收率。