3-methacryloyloxy-4-hydroxytetrahydrofuran | 915152-10-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧唑烯
• 英文名称: 3-methacryloyloxy-4-hydroxytetrahydrofuran
• 英文别名: (4-Hydroxyoxolan-3-yl) 2-methylprop-2-enoate
• CAS: 915152-10-2
• 化学式: C₈H₁₂O₄
• 分子量: 172.181
• InChiKey: WHFFGVJROYFBOU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  55.8
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 cis-3,4-dihydroxytetrahydrofuran 在 4-二甲氨基吡啶 、 吩噻嗪 、 N,N'-二环己基碳二亚胺 、 2,2,6,6-tetramethyl-piperidine-N-oxyl 作用下， 以 二氯甲烷 、 水 、 乙酸乙酯 为溶剂， 反应 48.0h， 以55.6%的产率得到3-methacryloyloxy-4-hydroxytetrahydrofuran
  参考文献：
  名称：

  WO2006/123473

  摘要：

  公开号：

文献信息

• Method for producing polymer
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10191373B2

  公开（公告）日：2019-01-29

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.

  通过在含有氮原子的不可聚合化合物溶液中聚合相应的单体，可获得一种聚合物，该化合物含有与骨架结合的酸发生器的递归单元，以及具有可选的酸标签基取代的羧基的递归单元和/或具有可选的酸标签基取代的羟基的递归单元。这样可以防止在正性抗蚀剂形成聚合物中发生酸标签基的脱保护反应，或在负性抗蚀剂形成聚合物中发生交联反应。
• Polymer, resist composition, and pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10457761B2

  公开（公告）日：2019-10-29

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers under such illumination that the quantity of light of wavelength up to 400 nm is up to 0.05 mW/cm2. The polymer avoids photo-decomposition of the acid generator during polymerization and concomitant deprotection reaction of the acid labile group when used in positive resist compositions. A pattern with high dissolution contrast and rectangularity is formed after development.

  在波长不超过 400 纳米的光照下，使相应的单体聚合，使光照量不超过 0.05 mW/cm2，可获得一种聚合物，该聚合物包含与骨架结合有酸发生器的递归单元，以及具有可选的酸标签基取代的羧基和/或具有可选的酸标签基取代的羟基的递归单元。这种聚合物在聚合过程中可避免酸发生器的光分解，以及在正抗蚀剂组合物中使用时可避免随之而来的酸性基团的脱保护反应。显影后形成的图案具有较高的溶解对比度和矩形度。
• JP2006321767A
  申请人：——

  公开号：JP2006321767A

  公开（公告）日：2006-11-30
• (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF
  申请人：Kusaka Haruhiko

  公开号：US20090076201A1

  公开（公告）日：2009-03-19

  The present invention provides a (meth)acrylate containing a heterocyclic ring, which is a structure necessary for achieving physical properties required in many fields, and a hydrophilic group in the same monomer molecule and further provides a process for producing the same from industrially easily-available starting materials by industrially feasible reactions. A (meth)acryloyloxytetrahydrofuran having a structure represented by the following general formula (1): wherein R 1 and R 2 each is a hydrogen atom or a (meth)acryloyl group represented by the following general formula (2) and at least one of R 1 and R 2 is a (meth)acryloyl group represented by the general formula (2).
• RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Takeshita Masaru

  公开号：US20100159389A1

  公开（公告）日：2010-06-24

  A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.