申请人:Hoffmann-La Roche Inc.
公开号:US04125726A1
公开(公告)日:1978-11-14
Compounds are disclosed of the formula ##STR1## wherein R.sub.1 is hydrogen, halogen or trifluoromethyl; R.sub.2 is selected from the group consisting of lower alkylthio together with the sulfoxide and sulfone thereof, halo, lower alkylamino or lower alkoxy; Y is oxo or thio; R.sub.3 is selected from the group consisting of hydrogen, --COOR.sub.4 wherein R.sub.4 is hydrogen or lower alkyl, --CONR.sub.6 R.sub.5 wherein R.sub.5 and R.sub.6 are hydrogen or lower alkyl; X is hydrogen or halogen; and R.sub.7 is lower alkyl or hydrogen and the pharmaceutically acceptable salts and N-oxides thereof. Also presented are processes to produce the above compounds and intermediates therefor and derivatives thereof.
本发明涉及公式为##STR1##的化合物,其中R.sub.1是氢,卤素或三氟甲基;R.sub.2选自较低的烷基硫醚以及其亚砜和磺酸盐,卤素,较低的烷基氨基或较低的烷氧基的群;Y为氧或硫;R.sub.3选自氢,--COOR.sub.4,其中R.sub.4是氢或较低的烷基,--CONR.sub.6R.sub.5,其中R.sub.5和R.sub.6是氢或较低的烷基;X为氢或卤素;R.sub.7为较低的烷基或氢,以及其药学上可接受的盐和N-氧化物。同时提供了制备上述化合物及其中间体和衍生物的方法。