HARDMASK COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN
申请人:OH Seung-Bae
公开号:US20120153424A1
公开(公告)日:2012-06-21
A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and a compound, the compound including a structural unit represented by the following Chemical Formula 1: